Used DELTA 5AQ #293628639 for sale

Manufacturer
DELTA
Model
5AQ
ID: 293628639
Wafer Size: 6"-8"
Vintage: 2005
Cassette nest, 6"-8" Developer system (2) Dispense arms (2) Cybor programmable metering pumps Dual end effector transfer arm Backside rinse Hepa filter EBR Canister Hotplate PC 2005 vintage.
DELTA 5AQ, also known as a photoresist equipment, is a type of technology that is utilized in the critical microelectronic device fabrication process. This type of technology is designed to enable technicians to generate durable, high-accuracy physical features on various substrates in a cost-effective manner. 5AQ system is an advanced lithography process that utilizes photopolymer multi-layer resists. The resist is created in a liquid form and is applied as a thin viscous film onto the substrate that is to be patterned. Once the resist has been applied, the substrate is subjected to an appropriate exposure wavelength of light. This exposure initiates a chemical reaction, which alters the resist's state making it less soluble and eventually hardens the resist film. After the exposure process, it is now possible to pattern the substrate by selectively washing away the altered resist. DELTA 5AQ unit allows for the fabrication of very fine and intricate physical features on the substrate due to the combination of the thin liquid film resist, the precise exposure wavelength, and the precise resist development process. In addition, 5AQ also provides exceptional edge definition, feature dimensional accuracy, and process throughput - all while at a low cost. DELTA 5AQ photoresist machine has become an important tool in the microelectronics industry due to its robust performance and cost effectiveness. It enables technicians to quickly and accurately generate precise physical features (down to 5 microns) on the substrate, which are essential to the performance of any device. 5AQ tool also provides excellent wafer-to-wafer and layer-to-layer control, which enables the technician to control the critical dimension (CD) of the substrates for precise device fabrication. In addition, DELTA 5AQ asset offers improved safety and environmental protection compared to traditional systems. Overall, 5AQ photoresist model provides precise physical features with an accurate and reliable process at an affordable price. It is an extremely important tool in the microelectronic industry and has become the standard for device fabrication in recent years.
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