Used HONJIG HJ-W001 #9155820 for sale

HONJIG HJ-W001 photoresist system provides a reliable and easy-to-use method for thin-film patterning. By selectively exposing and removing portions of a thin film with photons and subsequent physical ablation, HJ-W001 allows for efficient control of the region's characteristics such as composition, porosity, and thickness. At the heart of HONJIG HJ-W001 is a laser diode system with a 405nm laser wavelength. The beam is focused by a collimator that also controls its power. This beam is then directed onto a substrate such as silicon or glass. Below the substrate is a heater which elevates the substrate's temperature, which ranges from 500°C to 1000°C, depending on the materials being used. By adjusting the laser's power and the temperature of the substrate, HJ-W001 can be used to accurately remove thin layers of material in a specific pattern. HONJIG HJ-W001 photoresist system can also be used to create high-aspect ratio features, such as high contact holes, due to its unique spatial resolution control. This is achieved by the combination of a beam focusing lens with a beam deflection mechanism. By varying the laser's power and the substrate temperature, HJ-W001 can etch geometries with high resolution and aspect ratio. Additionally, HONJIG HJ-W001 has an optical microscope with a digital camera for visualization and for positioning of the pattern sites when programming. Further aiding in programming, HJ-W001 also has an intuitive user interface that makes programming and device control easy. Overall, HONJIG HJ-W001 is an excellent tool for thin-film patterning. Utilizing the laser's power and the substrate temperature, HJ-W001 provides features with adjustable aspect ratio and resolution. More importantly, it is equipped with intuitive user interface, high-definition camera, and programming software, all of which make HONJIG HJ-W001 a powerful, convenient, and easy-to-use tool for thin-film patterning.