Used KARL SUSS / MICROTEC AltaSpray #9210358 for sale

KARL SUSS / MICROTEC AltaSpray
ID: 9210358
Wafer Size: 8"
Spray coater, 8".
KARL SUSS / MICROTEC AltaSpray is an advanced photoresist equipment which enables users to deposit a thin accurate layer of photoresist resin on the substrate. This ensures uniformity of the coating and reliable results when utilizing photolithography techniques. MICROTEC AltaSpray system features a high-performance spray gun which allows for excellent control over the photoresist coating thickness over an area of up to 8 x 10 inches. KARL SUSS ALTA SPRAY offers precise and adjustable parameters for a variety of photoresist requirements. This includes control over spray distance, spray speed, pressure, and atomization. Additionally, the unit supports multiple coating modes such as full-field management, patch mode, or local coating. These features enable advanced capabilities such as controlling coating thickness over heterogenous substrate surfaces, independent control over each nozzle in multi-nozzle systems, and implementation of lacquer glazing techniques. KARL SUSS / MICROTEC ALTA SPRAY supports a variety of substrates and photoresists. The appropriate photoresist can be selected depending on the desired characteristics such as positive vs. negative photoresists, resolution, and other requirements. The tailored process enables the desired performance out of the photolithography process and is a key to reproducible results. Additionally, KARL SUSS AltaSpray includes post-treatment and cleaning options for completing the photolithography process. The machine supports the complete installation of spray cycle and cleaning cycle operations as part of a single program. It also features ultrasonic nozzles for improved cleaning capabilities. Long-term maintenance of the tool is also improved thanks to automatically monitored components and spare parts which can be efficiently replaced. In conclusion, ALTA SPRAY is an advanced photoresist asset which allows users to deposit accurate and consistent layers of photoresist over a variety of substrates. It offers adjustable parameters and supports multiple coating modes. Additionally, it enables post-treatment cycles and cleaning options for improved production throughput. In this way, AltaSpray helps ensure reliable results and increased production yield when utilizing photolithography techniques.
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