Used NEC FC-9821Ka #293663397 for sale

NEC FC-9821Ka is a photoresist equipment developed by NEC for use in various thin film deposition and etching applications. The system processes a wide range of substrates and offers unparalleled resolution of features down to 10nm. The unit utilizes the latest in LCOS (Liquid Crystal on Silicon) technology to focus the photoresist in an unparalleled manner. FC-9821Ka machine includes the latest in wafer inspection technology for precise characterization of features. This tool is designed for advanced patterning applications such as trenching, via filling, sub-micron design feature etching, and sidewall deposition. The exposure process is based on the photolithography process. With the advanced LCOS based reticle control asset and the Laser controlled Focus Latch Alignment (FLA) model, the equipment can provide unparalleled resolution. The photoreists used by the system are of high purity and can be patterned down to 150nm. NEC FC-9821Ka is also equipped with a Plasma Focus Ion Beam (PFIB) unit for etching and dry deposition of thin film materials. A helium glow discharge source enables excellent plasma etching selectivity and provides comparatively low operating costs. The PFIB machine is also built with ultra-high brightness to process delicate masking layers for advanced photolithography. The coater-developer unit included in FC-9821Ka contains chemical and spin-coating functions, offering a variety of photoresist applications from basic to ultra-complex situations. The integrated post-exposure bake process ensures accurate and repeatable wafer processing results. To maximize uptime, the tool is equipped with a printing and development cart. It is remotely controlled and can exercise all the features of the machine without manual intervention. The diagnostics help identify wafers or glass pieces that are difficult to process. It also enables the process optimization enabling greater repeatability and accuracy. In conclusion, NEC FC-9821Ka is a versatile and powerful photoresist asset that offers excellent features and reliability. With its advanced technologies and deep control over the parameters, the model can be used for a variety of thin film deposition and etching applications. The equipment offers precision and repeatability at high levels while also minimizing operating costs due to its integrated PFIB and coater-developer systems.