Used OPTORUN OTFC-1300 #293598129 for sale

OPTORUN OTFC-1300 is a high-performance photoresist equipment designed for wafer-level or substrate-level manufacturing applications. The system consists of a processing chamber, exposure light source, and control and monitoring hardware. The processing chamber is fully enclosed and enable a uniform climate. It is able to maintain temperatures between 20°C and 25°C and humidity between 20% and 50%. The machine also has the ability to counter pressure and thus achieve high uniformity of resist exposure. The exposure light source delivers UV radiation at a specific wavelength for resist processing. It is configured as a quad unit for maximum precision. Furthermore, special features such as adjustable exposure size and positional accuracy provide excellent precision and result uniformity from one substrate to another. The control and monitoring electronics are programmed using a PC interface. This includes settings for exposure parameters, temperature, humidity, pressure, and substrate transport. All parameters can be monitored in real time and adjusted as needed. The data can also be plotted in graphs for review and analysis. OPTORUN 1300 is designed with a modular structure and is easily integrated into existing factory automation. Further, with its state-of-the-art design and high performance, it guarantees improved production efficiency with minimal downtime and superb result uniformity. The photoresist machine is proven to reduce process variation and improve quality in the manufacture of semiconductor devices. It also is highly compatible with various industry-standard processes, from conventional spin-coating to advanced techniques such as chemical vapor deposition (CVD), metallization, and dry etching. Overall, OTFC 1300 is an excellent choice for any semiconductor production that requires precise, uniform, and repeatable resist exposure. It is capable of helping to reduce cycle time and increase product yield, resulting in increased productivity and lower production costs.