Used OPTORUN OTFC-1550 #293642596 for sale

Manufacturer
OPTORUN
Model
OTFC-1550
ID: 293642596
Optical thin film coater SUS304 Vacuum chamber: Φ1550 mm x 1800 mm Substrate dome size: Φ1400 mm Substrate dome speed: 10 RPM - 30 RPM Optical film thickness control system: HOM2-R-VIS350A Wavelength range: 350 nm-1100 nm XTC/3+6 Point type crystal sensor (2) EB Sources RF Ion source: 17 cm Vacuum system: Roughing pump (2) Diffusion pumps (2) Cryo pumps Cryo trap.
OPTORUN OTFC-1550 is a photoresist underspray equipment designed for use in the photographic, electronics, biomedical and manufacturing industries. This system is capable of providing uniform, reliable underspray coverage for photoresists and other sensitive materials at a high degree of accuracy. OPTORUN OTFC 1550 utilizes a high intensity laser for superior beam characteristics and excellent performance. The laser is enclosed in a protective housing and has an adjustable beam spot size to ensure that the power delivered is kept to a minimum, thereby reducing the risk of over-exposure and damaging the material being processed. This unit also contains a high resolution imaging machine, allowing for accurate imaging of the entire process area. OTFC-1550 also incorporates advanced software to control the entire process. This software allows the user to select the desired photoresist material, the application rate, and other parameters such as the laser wavelength, pulse frequency, power and duration. The software also allows the user to set up filters to reduce the risk of damage to the photoresist material. The operational guidelines provided by OPTORUN are very clear and easy to understand. This comprehensive instruction manual details the essential safety procedures and provides a comprehensive list of features and functions that enable users to maximize the performance of their tool. In addition to its excellent image quality, OTFC 1550 offers increased reliability, greater flexibility and lower operating costs. This asset is designed to provide superior quality, performance and cost-effectiveness for users in a wide range of industries. It is capable of providing excellent quality and resolution for photoresist materials, making it an ideal choice for many different applications.
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