Used OPTORUN OTFC-2350 #293610735 for sale

Manufacturer
OPTORUN
Model
OTFC-2350
ID: 293610735
Optical thin film coater NIPPON ELECTRONICS 16F Double gun POLYCOLD 1102 EDWARDS 275 Mechanical pump EDWARDS Roots pump Crystal control probe: 6-Points Ion source, 17" Vacuum gauge Heating wire Missing parts.
OPTORUN OTFC-2350 is a photoresist equipment designed for wet processing technology. It features a highly automated, high-efficiency design with robust dry-film coating capabilities for all types of photoresist applications. The system includes a 14-zone, self-contained, enclosed bath unit with adjustable temperature, agitation and pressure. This configuration maximizes the efficiency of photoresist deposition and protects expensive photoresist from external contaminants. The compatibility of the machine with multiple photoresist formulas eliminates the need for manual post-processing. The double layer wet processing tank provides ample capacity for movement of process solutions through the full bath. The agitation tool ensures homogenous photoresist deposition on both sides of the substrate and the built-in recirculation pump reduces water consumption while providing the uniform dispersion of photoresists. The asset's automated controls allow users to program the bath parameters and process recipes no matter the application. Additionally, the integrated industrial control devices guarantee atomized reinforcement and robust operation thanks to the use of industry standards. The model's self-monitoring capability and digital diagnostics assist users in troubleshooting quickly and accurately. OTFC-2350 offers durable construction and is designed to withstand repeated use and wear. The housing is sealed to minimize spillage while the powder-coated paint provides corrosion protection and the stainless steel framework ensures durability. The power and life cycle costs are minimized by incorporating efficient components and a variable frequency drive. The photoresist equipment delivers maximum efficiency, process flexibility and reliability for photoresist processing. It is suitable for a wide range of applications, from large-scale integrated circuit (LSIC) fabrication to post-developed processes. As such, it is an ideal choice for companies that require high-performance photoresist systems.
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