Used PURE AIRE UF72AE #9303096 for sale

PURE AIRE UF72AE photoresist equipment is an advanced, cost-effective solution for controlling the deposition of material and ensuring reproducibility of pattern transfer. In the photoresist process, UV Exposure of resists is used in order to define etch windows and create circuit patterns within a semiconductor wafer. UF72AE is a versatile photoresist system, which offers remarkable precision and flexibility. PURE AIRE UF72AE is capable of handling up to 200mm wafers with a single exposure and minimal distortion. This is thanks to two beam spots that are spaced and adjusted in real-time to optimal focus. Additionally, UF72AE is designed with an advanced lighting unit that ensures uniform distribution of UV light with maximum energy conservation. This helps to reduce costs prior to the exposure process, as well as always providing high-quality results. In order to maintain its accuracy, PURE AIRE UF72AE features the latest digital control technology for repeatable settings. The micro-precision optical components of UF72AE guarantee that the machine will maintain its focus accuracy over different wafer sizes. This is further enhanced by multiple filters, which ensure that the pattern transfer remains reproducible regardless of substrate thickness variations. Additionally, PURE AIRE UF72AE is compatible with all standard photoresist materials. This allows it to be quickly set up for various types of jobs and accommodate any type of substrate. Additionally, its patented Auto-Uniform Exposure Tool allows multiple jobs to be completed without any manual adjustments. This is all thanks to its built-in sensors, which constantly readjust the exposure parameters for optimal throughput. To conclude, UF72AE is an advanced, cost-effective photoresist asset. Its ability to precisely etch patterns and maintain optimum focus over multiple substrate sizes makes it the ideal solution for any photoresist process. Its digital control technology, flexible compatibility and Auto-Uniform Exposure Model ensure that pattern transfer is reproducible and accurate. This ensures that PURE AIRE UF72AE will remain a reliable and economical choice for all photoresist applications.