Used SEMITOOL 470F #178414 for sale

SEMITOOL 470F
Manufacturer
SEMITOOL
Model
470F
ID: 178414
Spin rinse dryer, (SRD), up to 6" Single Spin Rinser Dryer on a roll around cart Possible options include: rotors, static eliminator, resistivity monitor and water recirculator "F" model upgrade includes class 10 Poly.
SEMITOOL 470F is a photoresist processing equipment designed by SEMITOOL, Inc. The system is extremely versatile and capable of processing wafers of all sizes, ranging from 200mm or 8 inches in diameter, to 300mm or 12 inches in diameter. 470F is an all-in-one self-contained unit that includes the resist station, wash station,dry station, spin station, and the Mod-Lift, which removes wafers from the machine and places them in cassette carriers. The resist station features advanced, patented technology that ensures precise control and accurate monitoring of parameters such as temperature, pressure, flow, spin speed, and time. The chamber is capable of controlling temperatures up to 150°C and spin speeds up to 600 rpm, giving it the capability to apply a wide variety of photoresists and to work at high throughput. The chamber also features a SEMITOOL Ultra-Clean Level 4 wash path for excellent photo resists and resists residue removal. The spin station features both rotational speed and time control, and the spin speed can be adjusted from 200 to 600 rpm, giving it the ability to apply photoresists with varying thickness and properties. Furthermore, the Mod-Lift provides exact wafer placement so that wafers can be transferred quickly and securely out of the tool. It is also equipped with an additional security interlock feature to prevent unauthorized access. SEMITOOL 470F is designed to allow for easy and reliable process setups, from wafer loading to wafer unloading. It also features a Windows-based graphical user interface for ease of use, a dedicated recipe and data logging asset, and an apparatus management model that allows for tracking of maintenance history. The equipment also has full network capability, allowing for remote access and troubleshooting. Overall, 470F is an extremely versatile and reliable photoresist processing system that is easy to use and can quickly accommodate a wide variety of wafer sizes and photoresists. With its advanced technology and intuitive user interface, SEMITOOL 470F is the ideal choice for photoresist film processing, with the capability to process a wide range of wafers with varying thicknesses, layers and etch profiles.
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