Used SEMIX / TOK / TAZMO SOG #9097200 for sale

SEMIX / TOK / TAZMO SOG is a specialized photoresist system developed by Asahi Glass Co. Ltd. It is used to produce ultrafine line patterning in the fabrication process of a variety of electronic and semiconductor devices. The system consists of three core components: a 4 position type exposure unit, a solver for fine exposure control, and a post-processing tool. The 4 position type exposure unit is designed to optimize exposure time, focus, and intensity for each exposed area. It is capable of exposure to a wide range of resist materials up to a fine line patterning width of 0.75μm. The solver utilizes an optimized optical model for maximum exposure control accuracy and repeatability. This allows for improved resolution and reproducible patterning parameters. The post-processing tool is used to set line patterning parameters and adjust exposure time to fine tune the line pattern and resist resolution. TOK SOG system differs from traditional photolithography systems in that it has a shorter processing time to achieve fine line patterning and higher resolution. The thinner resists and ultrafine line patterning resolution allow for increased pattern density and design flexibility. The improved resolution and repeatability also enable better pattern accuracy and improved yield. SEMIX SOG is ideal for applications such as printed circuit boards, semiconductor production, medical device production, and other ultrafine line patterning applications. Its improved resolution and efficiency make it an attractive choice for those looking to reduce processing time and increase yield in their production processes.