Used SRD CT-303 #9301058 for sale

SRD CT-303
Manufacturer
SRD
Model
CT-303
ID: 9301058
Wafer spin dryer.
SRD CT-303 is a photoresist equipment used in semiconductor device fabrication. The system builds upon a conventional negative photoresist material which is exposed to ultraviolet light to create a pattern which is transferred to the substrate. CT-303 unit utilizes two liquid components, a photoactive and an inactive developer, providing flexibility in developing fine tolerances, subtle surface details, and intricate patterns. The photoactive component is a light-sensitive acrylate polymer, formulated by SRD, with specific molecular weights allowing for accurate resist thickness control, superior resolution, and a higher contrast image. This photoactive material is separated from the inactive developer by a light-blocking barrier, creating a machine which allows for exposure time to the UV light that can be rapidly adjusted. Once the exposure and redistribution time have been determined, the substrate is coated with the photoactive material. Using the same light exposure techniques used in conventional photoresists, the desired pattern is then created in the photoactive layer as the unexposed portions are washed away by the inactive developer. The patterns created in SRD CT-303 can range from 0.2 to 3.0 micrometers, and can be used to create mask layers with less than 1-micron-thick circuit lines. CT-303 tool offers several advantages over its competitors. Since this asset is designed for use on several different substrate materials, the resistor can work on organic, composite and oxide materials with ease, eliminating the need to switch between products depending upon the material. This model also has excellent optical transparency, allowing for the creation of thin layers and finer resolution. Overall, SRD CT-303 is a reliable and powerful photoresist equipment capable of creating intricate patterns down to a few microns. With superior resolution, an impressive transfer ratio, and excellent contrast between the exposed and unexposed layers, the system is suitable for many different substrate materials and applications.
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