Used TEL / TOKYO ELECTRON Clean Track ACT 12 #9190227 for sale
URL successfully copied!
Tap to zoom
ID: 9190227
Wafer Size: 8"
Vintage: 2001
(2) Coaters / (4) Developers system, 8"
In-line
Right to left
Loading configuration: 3 Foup type
Main controller: 2nd Controller
Main frame with system controller
CSB
PRB1
PRB2
IFB
Power box
T&H Controller
Chemical box
Thermo controller
(2) Mass flow controllers
Carrier station: 8" Foup type
(3) Cassettes / (25) Slots
Coater unit (2-1, 2-2 Module):
(4) Dispense nozzles
With temperature controlled lines for etch unit
RRC Pump
PR Suck-back valve: (8) Air operation suck-back valves
Rinse system:
(3) Liters
(2) Tanks
Buffer tank system
Programmable side rinse
(4) PR Nozzles
(8) Bottles
Thinner supply:
CCSS Supply
Local canister tank function
Photo resist temperature control system
Drain: Direct drain
Developer unit (3-1, 3-2, 3-3, 3-4):
(2) H Nozzles for each unit
Stream nozzle for DI rinse
(2) Points for back side rinse on each unit
Developer temperature control system
I/F Wafer stage type: NIKON (S204)
Adhesion unit:
100% Sealing closed chamber (Built-in hot plate)
HMDS Tank with float sensor in system
HMDS Supply: Local bottle
(8) Low temperature hot plates (LHP)
WEE Unit (Wafer edge exposure)
Type: DUV (UV254)
(7) Chill plates (CPL)
(4) Chilling hot plates (CHP)
TCP Unit
(2) TRS Units
SHU: (2) Shuttles
Chemical cabinet 1:
Solvent
Developer
HMDS Chemical cabinet
Temperature & humidity controller: Shinwa series (ESA-8)
Temperature control unit(TCU): TEL
AC Power box:
AC200 / 220V
Full-load current: 300A
Power: AC 208V, 3 Phase, 300A (Maximum)
2001 vintage.
TEL / TOKYO ELECTRON Clean Track ACT 12 is the latest and most advanced photoresist equipment available on the market. It is designed for ultra-low particle performance in the cleanroom environment. The system utilizes a unique combination of technologies including the proprietary Clean Track Auto Clean (CTAC) process which guarantee particle cleanliness, and advanced top-down scan tools for easy maintenance. The Clean Track Auto Clean (CTAC) process utilizes two sequential stages to ensure the highest particle free environment. Firstly, two separate activated brush modules are used to dislodge particles from any surface contours. These bristles are precisely tailored to the shape and size of the part or piece of equipment, ensuring that all contaminants are removed effectively. Secondly, a high airflow unit is used to extract the dislodged particles from the surface. The high air flow also applies an anti-static charge to the surface, further improving the particle-free environment. The machine also utilizes proprietary scan technology to detect any remaining particles. The scanning tool utilizes a 16-channel sensor array to detect particles as small as 1 micron. The sensors measure and compare particle characteristics including size, shape, and density, allowing for accurate identification of particle counts. Through this scanning process, the tool is able to detect and remove particle levels below the industry standard. TEL Clean Track ACT 12 asset also utilizes advanced temperature, humidity, and ozone monitoring techniques in order to ensure the cleanroom environment is consistently maintained. Temperature and humidity sensors monitor the environment in order to adjust the model as needed. Additionally, ozone sensors are used to detect the presence of any ozone-generating particles, and adjust the equipment's ozone production accordingly. The system provides complete control to the user, allowing for precise monitoring of the cleaning process. Additionally, both the dust and anti-static systems provide advanced statistical analysis tools, enabling users to monitor the cleaning thresholds and ensure optimal particle free performance. Overall, TOKYO ELECTRON Clean Track ACT 12 is a highly advanced photoresist unit, enabling users to achieve the highest levels of cleanliness in the cleanroom environment. The machine utilizes a combination of advanced technologies to allow for constant particle free performance, while providing complete control over the cleaning process.
There are no reviews yet