Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9282575 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8
ID: 9282575
Wafer Size: 8"
Resist coater / Developer system, 8" Multi block.
TEL / TOKYO ELECTRON Clean Track ACT 8 is a photoresist equipment which enables clean and accurate processing with minimal residues. It is a highly efficient and precise technology that uses telecentric optics and intelligent automations to enable higher levels of accuracy and throughput. The system is composed of four main components; the stage, the reticle, the lithography unit, and the photoresist station. The stage is a horizontal alignment machine with a moving stage and a stationary reticle. The moving stage is a reliable and durable motorized stage that supports a wide range of substrates. The stationary reticle provides a precision reference for accurate alignment and placement of the substrate. The lithography tool is composed of telecentric optics and scan control asset. The telecentric optics provides a deep focus and ensures uniform illumination of the substrates, allowing for more accurate exposure. The scan control model ensures that the exposure happens as specified, increasing throughput. The photoresist station is equipped with a spin-on processing head, which eliminates cross contamination during the process. It supports multiple types of spin-on photoresists, including positive, negative and neutral-type. It provides accurate spin-on coating and stable resist properties for optimal process control. Finally, TEL Clean Track ACT 8 equipment is accompanied by an automatic endpointing system that monitors and controls the exposure process, enabling improved throughput and accuracy. The end-pointing unit gives the user complete control of the exposure profile, ensuring uniform coverage and resolution. In conclusion, TOKYO ELECTRON Clean Track ACT 8 machine is a reliable, efficient and precise photoresist tool that is suitable for hobbyists, prototypists and professionals alike. The asset's telecentric optics, scan control model, substrate stage and resist station combine to provide high levels of accuracy and productivity. The automatic endpointing equipment ensures that the exposure process is completed as specified, allowing for more uniform coating and greater resolution.
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