Used TEL / TOKYO ELECTRON Clean Track Lithius #9275995 for sale

TEL / TOKYO ELECTRON Clean Track Lithius
ID: 9275995
Wafer Size: 12
System, 12".
TEL / TOKYO ELECTRON Clean Track Lithius is an Advanced Photolithography equipment designed for manufacturing high-precision electronic components and other semiconductor devices on an industrial scale. The system utilizes an optimized photoresist process to produce ultra-fast, clean-cut device patterns of the highest accuracy available in the market. The Photolithography unit consists of a light source, a pattern mask, a lens, a wafer receiving point and a photoresist layer. The light source, typically a DUV laser, is projected through the pattern mask, which contains the desired design pattern, and directed through the lens onto the wafer receiving point. The photoresist layer, which consists of a photosensitive material, is then applied onto the wafer receiving point and exposed to the pattern from the mask. Once exposed to the light, the photoresist layer undergoes changes in its physical and chemical properties due to exposure to the light radiating from the mask. Depending on the intensity of the light, the photoresist will either evaporate or coat the surface of the wafer in a highly accurate pattern. The light acts as a catalyst to the physical and chemical reactions of the photoresist which then allows for the precise patterning which is required in order to create the desired components. TEL Clean Track Lithius offers a range of features to assist the photoresist process. The internal control machine ensures that the light exposure is optimal, and its unique multi-functional platform allows for a variety of patterning operations. Additionally, the photoresist patterning process can be protected by the use of an anti-glitch filter, which removes electrical noise and prevents disruptions to the lithography tool. Overall, TOKYO ELECTRON Clean Track Lithius offers a reliable and efficient way to manufacture high-precision electronic components and semiconductor devices. Its optimized photoresist process produces clean-cut patterns of the highest accuracy and the platform features advanced protection and control mechanisms to ensure high-quality results. With its combination of features, Clean Track Lithius is the perfect choice for any industrial-scale component manufacturing.
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