Used TEL / TOKYO ELECTRON Clean Track Mark 5z #9198153 for sale

TEL / TOKYO ELECTRON Clean Track Mark 5z is a photoresist equipment used for producing microelectronic devices. It is well known for its industry-leading capabilities in providing superior particle and electrostatic discharge results, as well as superior cleanroom and factory yields. The Mark 5z is an essential tool in the production of integrated circuits (ICs), OLEDs, LEDs, and other devices that require extreme cleanliness. The photoresist system consists of two main components: a laser-based exposure unit and a solution-based exposure machine. The laser-based exposure tool uses a focused laser quantum to precisely project light patterns on a substrate that has been coated with a photosensitive material. By carefully tuning the light intensity and pattern, the material will be exposed and converted into a photoresist layer. The photoresist layer is then used as an etch mask during chemical etching processes, which are used to produce the components of a microelectronic device. The solution-based exposure asset accurately bathes the substrate in a liquid containing photosensitive chemicals. These chemicals react to a specified light intensity, yielding a photoresist layer of the desired shape. This exposure model is suitable for microstructures which could not be exposed accurately with a laser-based equipment. The Mark 5z uses three distinct stages to ensure the highest yields and reliability of the photoresist process. The first stage of the process includes pretreatment, in which the substrate is prepared for the photoresist application. This includes removal of surface contaminants, rinsing, heated drying, and metal deposition, all of which help to ensure that the photoresist adheres evenly and strongly. The second stage is the photoresist-layer construction, during which both laser and solution exposure systems are used. During this stage, the substrate is either sprayed with photoresist material or exposed to a laser or liquid. This creates a precise replication of the design provided, allowing for highly precise fabrication of complex microelectronic structures. The third stage of the process is the development stage, during which outgassed chemicals passed through Bake mode to lift and remove the photoresist layers. Unwanted material is then removed using a variety of techniques. Once the development process has been completed, the substrate is ready for further processing and use. Overall, TEL Clean Track Mark 5z is a reliable photoresist system capable of producing high yields and Component Perfection. It is used in many industries to meet the needs of today's increasingly sophisticated microelectronic devices.