Used TEL / TOKYO ELECTRON Clean Track Mark II #293672262 for sale

ID: 293672262
Vintage: 1988
Coater system 1988 vintage.
TEL / TOKYO ELECTRON Clean Track Mark II Photoresist Equipment is a best-in-class tool for precision substrates cleanroom processes. This system enables quick, high-quality photoresist patterning procedures with minimal personnel interaction. It features a semi-automatic track unit for multi-step film processes, allowing efficient substrate processing. The machine employs several process chambers, each with its own independent operation. The process sequence consists of deglaze, substrate cleaning, adhesion, soft bake, exposure, post-exposure bake, and post-exposure processing. The deglaze chamber is designed to remove surface contaminants from the substrate and prepare it for adhesion. This is done by subjecting the surface to a high-energy vacuum and then sputtering the substrate with argon plasma. The substrate cleaning chamber uses a patented hydrophilic solvent cleaning method to remove organic residues and hydrophobic films from the substrate. The adhesion chamber is a chemical vapor deposition process where a monolayer of silicon organosilane is bonded to the wafer surface. This helps ensure subsequent layers to bond properly with the substrate. The soft bake chamber further preps the wafer for further processing by subjecting it to high temperatures to evaporate residual solvents and enhance the surface adhesion of the photoresist. In the exposure chamber the required photomask is aligned with the wafer, and an ultra-violet light is shone through the mask to contact-expose the pattern onto the wafer. A post-exposure bake is then performed in the post-exposure bake chamber to harden and develop the photoresist. In the post-exposure processing chamber, the exposed wafer is treated with a special chemical processing agent which reveals the photolithographic pattern on the substrate. TEL Clean Track Mark II Photoresist Tool is designed for precision and repeatable photolithographic results. It is a reliable and precise tool for high-quality cleanroom operations. It is a highly productive and efficient asset ideal for any research or production environment.
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