Used SEMICS Opus II #9284014 for sale

SEMICS Opus II is a high-end, flexible, and highly precise metrology tool. It is designed for advanced probing and measurement operations in the semiconductor industry. The tool consists of two main components: a fully automated, multi-sensor actual scanner and a user-friendly software equipment. The software module is an embedded, Windows-based platform that is connected with the actual scanner, performing real-time data capture and control support. The application suite is equipped with a large variety of configuration options, such as multi-lane running with real-time device reprobing, deferred probing, as well as logic verification. Its user-friendly interface allows for quick and easy setup and efficient data management. The actual scanner is a semi-automated, semi-movable system that is built with a 3-axis positioning platform with 5-axis drive unit. The platform allows for an automatic scanning of a predefined surface, while it also allows manual adjustment and calibration for specific parts or locations on the objects being tested. The high-resolution CCD cameras and X-ray source imaging help navigate and analyze any data sets acquired from each position. The machine can measure not only the size and flatness of the surfaces of semiconductor wafers, but also capture metrology and overlay values from each of the different layers. The various measurement functions delivered by Opus II are supported by several different high-end metrics and tools, such as: Auto-Lane Measurements, Noise Analyzer, Partial Overlay Monitoring, and Probe Based Defect Measurement. All these metrology tools help the tool accurately and precisely measure and analyze its results. SEMICS Opus II is one of the most advanced, versatile and accurate metrology systems available for the semiconductor industry. It is a key tool used for the testing and development of next-generation semiconductor products, and for creating secure integrated circuit designs. With its high-end technology and comprehensive metrology features, Opus II makes it possible to greatly reduce manufacturing costs and improve production speed.