Used DNS / DAINIPPON LA-820 #9148527 for sale

DNS / DAINIPPON LA-820 is a rapid thermal processor (RTP) that is used to provide heat treatment for substrates or wafers in order to create desired electrical, optical, and mechanical properties. The RTP uses a combination of heating elements, gas control systems, and vacuum technologies to provide uniform heat treatment of the substrate, while ensuring minimal heat loss or radiation outside the chamber. DNS LA820 features two independently operated chambers, which are ideal for processes that require different temperatures at different stages. With each chamber being independently operated, it allows for quicker cycle times, fewer maintenance costs, and less contamination between processes. It also features a temperature control system that allows for precise control over temperatures from chamber to chamber. The RTP has a high accuracy pyrometer which measures the substrate temperature continuously and independently for each chamber. This ensures that the precise temperature setting is maintained during the process. The pyrometer can measure temperatures up to 900°C. The temperature uniformity between chambers is also within ±1°C. DAINIPPON LA 820 also features a fast cycle time which minimizes energy costs. It's gas flow controller allows for independent gas flow control for each chamber. This provides accurate gas control which ensures reliable wait-for-temperature measurement. The total cycle time for the RTP typically ranges from 10 seconds according to the substrate size, temperature profile, and gases used. In addition to gas control, LA 820 also has an active vacuum system which contains an integrated spiral turbo pump and a roughing pump. This eliminates the need for an external pump and prevents contamination between processes. The integrated vacuum system also provides a controlled atmosphere for processes such as oxidation or nitridation. Overall, DNS / DAINIPPON LA 820 is an efficient rapid thermal processor that can provide high accuracy, high temperature heat treatment for substrates and wafers. It provides fast cycle times and precise temperature control, while also providing reliable gas control and a controlled atmosphere.