Used AIXTRON AIX 2800 G4 HT #9256418 for sale

Manufacturer
AIXTRON
Model
AIX 2800 G4 HT
ID: 9256418
Vintage: 2011
MOCVD System Capacity: 42x2", 11x4", 6x6" Wiring: 4-Wire with Ground Hydride line: NH3-1, NH3-2, SiH4 MO Source: TMGa-1, TMGa-2, TMAl-1, Cp2Mg-1, TMIn-1, TMIn-2, TEGa-1, TEGa-2 MFC: Horiba Temperature monitor: EPI TT Power supply: 400 / 230 V AC, 3 Phase 2011 vintage.
AIXTRON AIX 2800 G4 HT is a leading-edge reactor equipment used primarily in the field of semiconductor epitaxy. This system is capable of performing large area growths, enabling production of full-chip CMOS and optoelectronic devices with small feature sizes. AIXTRON AIX 2800G4-HT is a horizontal high-throughput showerhead reactor with a three-zone design consisting of a lower pre-heater, a high-temperature growth chamber, and a heat exchanger. In the high-temperature growth chamber, high temperature and low pressure can be maintained and controlled with precision. The high-throughput showerhead ensures uniform gas flow rate and excellent gas uniformity from the pyrolysis tube and is designed to reduce chamber contamination and generate fewer particles than conventional systems. AIX 2800G4 HT is equipped with robust process control and monitoring systems for precise layer thickness control and for providing detailed feedback of parameters related to layer composition. Its in-situ analysis systems provide real-time information of the crystal lattice structure and the layer composition during growth process. AIX 2800 G 4 HT offers a range of options for controlling substrates, including a showerhead for uniform deposition, a static substrate holder with a temperature range of up to 1100 degrees Celsius, a two-stage platform lift, and an automated substrate exchange mechanism. For maximum efficiency, the substrate slide is equipped with an RTP (rapid thermal processing) option with a temperature range of up to 1045 degrees Celsius. AIXTRON AIX 2800G4 HT is a powerful and reliable unit well-suited for production applications. This machine is capable of producing a variety of materials with excellent quality and reproducibility, making it an ideal choice for high-volume semiconductor manufacturing processes. With its user-friendly control tool, users can easily adjust and monitor the parameters of their growth run for optimal results. AIXTRON AIX 2800 G 4 HT is equipped with extensive safety features for reliable operation, such as interlocks, alarms, and a built-in safety substrate holder.
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