Used AIXTRON Crius I #9135803 for sale

Manufacturer
AIXTRON
Model
Crius I
ID: 9135803
Vintage: 2010
31x2" IC GaN System, TMGa-1 TMGa-2 TMAl-1 Cp2Mg-1 Cp2Mg-2 TMIn-1 TMIn-2 2010 vintage.
AIXTRON Crius I is a high-performance chemical vapour deposition (CVD) reactor based on CERN-developed mass production technology. Crius I is designed to be highly efficient and cost-effective for the production of high quality compound semiconductor and organic electronics devices. This enables manufacturers to achieve the best possible device quality, process consistency and cost savings. AIXTRON Crius I is a cylindrical rack-mounted, closed-chamber, electron-beam evaporated CVD reactor. This reactor is designed to be robust and reliable, with a minimal footprint of just 1.5m2. The design allows for fast and efficient process initiation, with a typical start up time of less than 10 minutes. The chamber is also able to retract, which facilitates maintenance and termination of the process. Crius I is capable of achieving a wide range of process gases and temperatures, making it suitable for a variety of deposition processes. This makes it ideal for the production of compound semiconductor and organic electronics devices, such as LEDs, OLEDs, and optoelectronic and photonic devices. AIXTRON Crius I is also equipped with an advanced control system. This enables precise optimization of the process parameters, allowing manufacturers to achieve the best possible device quality and process consistency. Crius I is extremely energy efficient, with an average power consumption of only 500W, which contributes to cost savings. In conclusion, AIXTRON Crius I is a high-performing and energy efficient CVD reactor designed for the mass production of compound and organic electronics devices. This reactor is ideal for achieving the best possible device quality and process consistency, while also contributing to cost savings.
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