Used AMAT / APPLIED MATERIALS 0010-03840 #293659921 for sale

ID: 293659921
Heater.
AMAT / APPLIED MATERIALS 0010-03840 is a general purpose reactor for CVD (chemical vapor deposition) processing and can be used in a variety of semiconductor device fabrication applications. The vacuum chamber is constructed of stainless steel and measures 48 inches in diameter and 48 inches in length. It is capable of operating at pressures up to 400-500 mbar and temperatures up to 400°C. The internal substrate platen measures 24 inches in diameter and can accommodate four 200mm wafers. The reactor is equipped with an RF power supply and UPW (ultra-pure water) equipment used to maintain a clean, dry process environment. The system can be fitted with additional optional equipment to provide additional ancillary functions, such as ionization, plasma etching, and substrate heating. AMAT 0010-03840 CVD reactor features high uniformity of temperature (<±3°C) across the wafer surface and is capable of achieving a high rate of uniformity of film deposition (<±2%). It is also equipped with an emergency process-gas shutoff unit and a safety machine monitoring chamber pressure, temperature, and emergency pressure relief. The reactor design is compact and economical, making it ideal for use in research and prototyping applications. The RF power generator offers high control and provides for high levels of control over the deposition parameters of each layer. The tool is highly automated and requires minimal personnel training and time to get up and running. In addition, the asset is extremely reliable and reliable with minimal downtime and service requirements. In conclusion, APPLIED MATERIALS 0010-03840 CVD reactor is a reliable, high-performance CVD model that can be used to fabricate a variety of semiconductor devices. Its compact, economical design makes it a great choice for applications where cost and space are of concern. The high uniformity of temperature, film thickness, and deposition rate, as well as its safety, reliability, and ease of use all contribute to making the equipment an excellent choice for many applications.
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