Used AMAT / APPLIED MATERIALS Centura DPS II #9120412 for sale

AMAT / APPLIED MATERIALS Centura DPS II
ID: 9120412
Wafer Size: 12"
Polysilicon etcher, 12".
AMAT / APPLIED MATERIALS Centura DPS II reactor by AMAT is an advanced wafer processing equipment designed to achieve the highest possible productivity in semiconductor processing. The system has a maximum practical throughput of up to 115 wafers per hour making it one of the fastest reactors in the industry. The unit is powered by a three-zone source which vaporizes particles from the evacuable bell jar and them directs them into the reactor thus reducing particle residues and improving performance. It also includes two rotatable substrate holders, two independently controlled temperature zones, and two remote process control zones. AMAT Centura DPS II reactor also offers excellent control of the process environment with active temperature and pressure control. The active temperature and pressure control allows the reactor to maintain tight control over the process temperature, pressure, and atmosphere resulting in the highest possible product yield. The machine also includes advanced data logging and process recipe execution which provide the greatest possible control over tool performance and product yield. The data logging allows an operations personnel to monitor the run-time values of critical process parameters, enabling them to improve process control and product yield. With the process recipe execution, APPLIED MATERIALS CENTURA DPS+ II provides a high degree of accurancy and repeatability when running complex chemistries with multiple polysilicon and metal layers. AMAT CENTURA DPS+ II is the perfect tool for any semiconductor processing environment that needs high throughput, fast process times, and extreme precision. With its advanced features and control of the process environment, AMAT / APPLIED MATERIALS CENTURA DPS+ II is capable of achieving the highest yields and lowest defect rates for the most complex chemistries.
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