Used AMAT / APPLIED MATERIALS Centura DPS II #9188294 for sale

AMAT / APPLIED MATERIALS Centura DPS II
ID: 9188294
Vintage: 2002
Etcher 2002 vintage.
AMAT / APPLIED MATERIALS Centura DPS II is an advanced thermal high density plasma reactor. It is designed to provide high deposition rates for a range of plasma deposition processes that require high energy electron beams, such as epitaxy, CVD, ALD and ALOx coating etc. AMAT Centura DPS II offers state-of-the-art physical and chemical vapor deposition capabilities. The reactor is equipped with an advanced multi-grid electron source allowing both uniform and non-uniform distributions, and a large substrate pressure range. The reactor also features an independent gas flow control equipment that supports up to seven individual test gas lines. APPLIED MATERIALS CENTURA DPS+ II comes with a fully automated chamber cleaning process for fast and efficient startup, shutdown, and reduced downtime. The efficient surface treatment process includes an automated gas flow monitor, as well as a multi-zone pressure sensor. This allows deposition processes with process gases to occur such as oxygen, nitrous oxide, carbon monoxide, chlorine, and trichlorosilane. The control and data acquisition system of the reactor has been designed to provide process monitoring and data logging functionality. Furthermore, the reactors allow for custom recipes to ensure optimal thermal control, uniform deposition, and reduced re-deposition. The unit is capable of delivering optimum uniformity and deposition on both flexible and rigid substrates. This ensures uniform deposition across various areas on the substrates and ensures the best yield. AMAT CENTURA DPS+ II reactor is equipped with an inert gas back side exhaust feature that minimizes the risk of substrate contamination and degradation. AMAT / APPLIED MATERIALS CENTURA DPS+ II can be used for a wide variety of applications such as creating thin films in the semiconductor industry to packaging microelectronic devices. The multi-zone deposition machine and wide range of deposition gases enable researchers to achieve significant manufacturing productivity and process robustness. The tool is also equipped with safety features that ensure the safe operation of the reactor and the avoidance of hazardous processes.
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