Used AMAT / APPLIED MATERIALS Centura DPS II #9189076 for sale
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ID: 9189076
Wafer Size: 8"
Vintage: 2002
Metal etcher, 8"
Platform type: Centura AP
Chamber configuration:
Chamber A & B: DPS II Metal bridge chamber, 8"
Chamber C: ASP II Chamber
Process chamber:
Process kits:
DPS II Metal parts / Chamber
Ceramic Lid
ESC Type: DPS II STD CESC, 8"
ESC Power supply: DPS II STD
Control type:
APPLIED MATERIALS STD (VAT)
Chamber A: 65048-PH52-AFS1 / 0583 A-664028
Chamber B: 65048-PH52-AFS1 / 0546 A-626798
EOP Type: Monochromator
Transfer chamber:
Robot type: VHP+ Dual blade
APPLIED MATERIALS STD LCF Detector
Loadlock chamber:
SWLL Body: (2) SWLL Chambers
EFEM:
(2) Loadports
ASYST Versaport 2200
Air intake system: APPLIED MATERIALS STD Intake
FI Robot: APPLIED MATERIALS Kawasaki
Wafer align: APPLIED MATERIALS STD
Wafer out of position detection: APPLIED MATERIALS STD
Remote interface:
Components interface:
Dry pump (Transfer chamber): IPUP Pump, ALCATEL A100L
Chiller
System monitor: Monitor 1 & Monitor 2
Flat panel with keyboard on stand
Components:
Turbo molecular pump: APPLIED MATERIALS STD BOC EDWARDS
RF Power system:
Source RF generator:
APPLIED MATERIALS STD / APEX 3013
Frequency / Max power: 13.56MHz / 3KW
Bias RF generator:
APPLIED MATERIALS STD / APEX 1513
Frequency / Max power: 13.56MHz / 1.5KW
RF Match box:
Source: Navigator 3013
Chamber A & B: 0190-15168
Bias: Navigator 1513
Chamber A: 0190-23623
Chamber B: 0190-15167
Utility specification:
Gas panel type: STD
Gas panel exhaust: Top center exhaust
(12) Gas lines
Gas line tape heater (for liquid gas): BCL3
MFC Configuration:
MFC type: Digital type
MFC Maker / Model (All Chamber): UNIT MFC
Gas information:
Gas Size
BCL3 200
CL2 200
NF3 100
HCL 100
NF3 20
N2 50
HE 100
O2 1L
SF6 400
CHF3 25
CF4 50
AR 400
Axiom + chamber:
Gas Size
NH3 1000
O2 10000
CF4 750
N2 1L
Independent helium control: APPLIED MATERIALS STD MKS 649A
Electricity:
AC Rack: APPLIED MATERIALS STD AC Rack
Power supply: 3 φ, 208 V, 400 A, 50/60 Hz
System controller:
FES: FEPC
FIS: Flex3
MF SBC: Flex3
CCM SBC: 166 MHz
MF Controller:
Mainframe devicenet I/O:
Cardcage and backplane board
2002 vintage.
AMAT / APPLIED MATERIALS Centura DPS II is a dual-zone rapid thermal reactor designed for advanced materials processing in a variety of applications. It features a powerful RF generator that can generate high-power with precise temperature control for precise processing of thin films, multi-layer structures, and stacks of devices. The main function of AMAT Centura DPS II is to deposit multiple layers of different materials onto a substrate in a precise and precise manner. This is done by utilizing a dual-zone configuration of the dual-zone Rapid Thermal Processor. The two zones are independent, which allows precise temperature profiles to be created in each zone. This is done by individually controlling the heaters, monitored by advanced computerized control systems. The dual-zone configuration in APPLIED MATERIALS CENTURA DPS+ II allows uniform heat distribution and precise temperature control. This is done by having both zones heat up to different temperatures, which will be determined by user-defined parameters. The RTP reactor also has the ability to contain and confine gas mixtures of different composition and concentration for precise composition controlled reactions. Centura DPS II uses active cooling to quickly cool down after each zone reaches a desired temperature for precise and consistent deposition. This multi-zone RTP configuration also allows for precise ramp up and ramp down rates for each zone, which is essential in the research of thin and thick film deposition. APPLIED MATERIALS Centura DPS II also features advanced diagnostic features that allow engineers and scientists to precisely monitor and measure the materials being processed in the RTP reactor. This monitoring is especially useful in multilayer and stack device experiments where precise layer properties are desired. CENTURA DPS+ II is a valuable tool for scientists and engineers in the advanced materials processing industry due to its precise temperature control, precise deposition rate, and precise monitoring capabilities. The reactor has been used in many applications, ranging from semiconductor device fabrication, thin film deposition, and many more. The central heating, cooling, and monitoring capabilities of AMAT CENTURA DPS+ II make it an invaluable tool in research and industrial production.
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