Used AMAT / APPLIED MATERIALS Centura DPS II #9377213 for sale

AMAT / APPLIED MATERIALS Centura DPS II is an advanced reactor equipment designed for handling complex processes in semiconductor fabrication. This system provides a single platform that can be adapted to various applications in MEMS, thin films, and MEMS. It features a universal chamber design that can be adapted for multiple process types including plasma etch, thermal anneal, encapsulation, deposition, and oxidation. This unit is powered by a multi-gas source and ultra-low pressure operating range and a high temperature manufacturing process. AMAT Centura DPS II reactor includes a touchscreen HMI with machine monitoring, recipe control, and remote access capability. It is also equipped with high-pressure, pulsed-rf plasma sources enabling processes at very low pressures. It provides a precise control over process parameters and variable multi-channel gas delivery, allowing exacting control of process parameters and a wide range of variation in inductance controls. Additionally, APPLIED MATERIALS CENTURA DPS+ II includes sensor technology for process monitoring and advanced hardware for repeating process reproducibility. This tool also has a time-saver feature which allows up to three gas sources to be changed simulataneously to reduce cycle time. The entire asset is designed for precise, repeatable, and reliable operation and is compatible with leading vacuum systems. Centura DPS II reactor provides a reliable and efficient solution to advanced research needs in the semiconductor industry. It delivers high quality process results while maintaining process repeatability and yield. Its features enable efficient process control, improved yield, and higher quality products. This model is a valuable tool for advanced research, prototyping, and manufacturing of semiconductor components.