Used AMAT / APPLIED MATERIALS Centura DPS #9093380 for sale

AMAT / APPLIED MATERIALS Centura DPS
ID: 9093380
Wafer Size: 8"
Vintage: 1997
Poly etcher, 8", 1997 vintage.
AMAT / APPLIED MATERIALS Centura DPS is a unique multiple chamber wet processing reactor for the next-generation of manufacturing and technology development. This reactor is equipped with multiple chambers, providing an innovative and flexible solution to processing challenges. The reactor provides an ideal combination of high throughput, quick process turnaround and superb process control. AMAT Centura DPS reactor is a combination of multiple chambers equipped with deposition and etch capabilities. This allows for the integration of multiple process steps into one reactor. It is ideal for two-by-two systems, where two deposition processes can be performed in one chamber, with two etch processes performed in another chamber. This allows for quick production throughout and the flexibility to adjust process parameters on the fly. The reactor has several features for greater control, ease of operation and maintenance. It has a composite ceramic lined vacuum chamber, with high fidelity robotic arms and a multi-axis motion control system. The vacuum chamber design gives superior thermal management and improved process control, while the robotic arms and multi-axis motion control provide excellent wafer handling and process control. Other features such as high performance RF generator and optical emission spectroscopy ensure superior process uniformity and repeatability. The reactor has the capability to process large substrates with processing times up to minutes. It can also process smaller substrates in a fraction of that time. This is due to its highly efficient processing chamber design and its optimized RF power delivery system. It is suitable for low- volume production and research and development applications. APPLIED MATERIALS Centura DPS reactor is a versatile and powerful tool for researchers and manufacturers alike. It provides excellent process control with high throughput, consistent deposition rates and superior thermal management. It provides a flexible solution that can handle a wide range of process tasks. The reactor is ideal for high-volume production and research and development, and is highly efficient, fast and reliable.
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