Used AMAT / APPLIED MATERIALS Centura I DPS+ #9093402 for sale

AMAT / APPLIED MATERIALS Centura I DPS+
ID: 9093402
Wafer Size: 8"
Vintage: 1998
Poly etcher, 8", 1998 vintage.
AMAT / APPLIED MATERIALS Centura I DPS+ is a highly efficient, team-based PECVD (Plasma Enhanced Chemical Vapor Deposition) reactor that is designed to meet ultra-high aspect ratio processing requirements. Utilizing a 400mm platform and a multi-station design, the DPS+ allows for the integration of up to five tools per platform and is ideal for hybrid integration of multiple film areas. At the core of the DPS+ lies the world-class AMAT Centura I HD PECVD processing technology. It is designed to deliver superior film uniformity, repeatability, and high deposition rates. The flexible design of the equipment allows for up to five tools to be integrated into a single platform with options to incorporate the latest alloy processing technologies. This multi-station capability is ideal for applications such as MEMS (microelectromechanical systems) or FEOL (front-end-of-line) development which requires different deposition layers on different wafers. The system also includes a unique reactant unit, which enables reactant mixtures to be manipulated easily. This allows the user to adjust deposition parameters such as rate, conformality, and throughput. Additionally, the machine is designed to simplify wafer handling and improve productivity by utilizing split wafer cassettes for quick reloading of successive wafers. The tool also features real-time process monitoring, with comprehensive feedback systems that provide detailed information on process conditions, allowing the user to adjust parameters as needed. Additionally, it is equipped with a sophisticated, user-friendly IT infrastructure that makes it easy to integrate data and files into the asset. This increases the model's productivity and helps ensure a consistent product quality. Overall, AMAT Centura I DPS+ is a highly efficient and versatile PECVD equipment that is designed to meet the needs of various advanced deposition applications. With its wide-ranging capabilities, ability to target multiple film stacks, and high throughput, the DPS+ is the ideal reactor for applications such as MEMS and FEOL processing.
There are no reviews yet