Used AMAT / APPLIED MATERIALS Centura WCVD #9116744 for sale

ID: 9116744
Wafer Size: 8"
WxZ System, 8" (2) Chambers Loadlock: N/B Mainframe: Centura Phase Robot: HEWLETT-PACKARD Enhanced cooling Gas control type: VME1 Generator: OEM12B3 SBC BD: V440 Heater included.
AMAT / APPLIED MATERIALS Centura WCVD is a chemical vapor deposition (CVD) reactor designed for epitaxial processes of advanced materials. It is used for the growth of tight grain structures and epitaxy of high-level integrated circuit substrates. The WCVD utilizes the latest advancements in reaction chamber design for excellent performance, process uniformity, and robustness. AMAT Centura WCVD features a vertical tube reaction chamber which is water cooled for superior thermal management. The reaction chamber features removable RF/DC magnets for a wide range of epitaxial (wafer growth) processing and machine manipulation capabilities. The reaction chamber is also designed with gas containment features, such as an enhanced shape and RF-shielding plates, for improved safety during operation. APPLIED MATERIALS CENTURA WCVD is powered by an advanced control system which offers a wide range of process monitoring options. It features advanced temperature and pressure control, high-precision thermal management, RF power and source gas control. Additionally, the pressure and temperature inside the reaction chamber can be maintained within a range of 10 millitorr and 100 Celsius, respectively. For materials preparation, AMAT / APPLIED MATERIALS CENTURA WCVD is equipped with a load-lock chamber, integrated with a cassette-based loading module. This load-lock chamber makes it easier to transfer wafers from the cassette to the processing chamber. It also features a side-load port, allowing for direct deposition onto vacuum chambers. Furthermore, AMAT CENTURA WCVD is equipped with an extensive range of accessories including exhaust pumps, gas delivery systems, and heated and cooled transfer lines for enhanced operation. Centura WCVD is an advanced CVD reactor ideal for epitaxial processes of advanced materials. With its innovative reaction chamber design, advanced temperature and pressure control capabilities, high-precision thermal management, and extensive range of accessories, CENTURA WCVD offers excellent performance, process uniformity, and robustness.
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