Used AMAT / APPLIED MATERIALS Endura CL #9237067 for sale

AMAT / APPLIED MATERIALS Endura CL
ID: 9237067
Wafer Size: 12
Vintage: 2003
PVD system, 12" 2003 vintage.
AMAT / APPLIED MATERIALS Endura CL is a high-performance chemical vapor deposition (CVD) reactor designed for use in production. It is utilized for thin film deposition and processing, semiconductor fabrication and related industries, and is an integral part of the advanced manufacturing process. AMAT Endura CL is equipped with many features to maximize precision and efficiency, such as an enclosed process chamber, dual-path processing capabilities, optimized cooling, and a built-in evacuation equipment. The enclosed process chamber allows for a tightly controlled environment, with a unique design that promotes uniform temperature distribution and superior temperature stability. Dual-path processing enables highly advanced, multi-layer and multi-material deposition. The cooling system can be optimized to save energy and process time, with a built-in evacuation unit allowing gases to be quickly and efficiently removed from the chamber. This maintains the purity of the gas, allowing for consistent deposition. APPLIED MATERIALS Endura CL also features advanced process monitoring and control capabilities. Temperature, liquid and gas flow, and pressure are all monitored, creating a near real-time view of the process. This provides visibility into the machine performance, allowing for greater consistency and precision. Endura CL has an overall process stability of +/-1 degree Celsius, and supports a wide variety of deposition processes, including metalorganic, electrochemical, atomic layer, and physical vapor deposition. It is also capable of producing a range of materials, from metals to oxides to dielectrics. Overall, AMAT / APPLIED MATERIALS Endura CL is a sophisticated CVD solution that is designed to help maximize efficiency, increase throughput, and deliver consistent, high-quality results. With its advanced process monitoring, dual-path processing capabilities, and optimized cooling, it is an ideal tool for precision IC, MEMS, and thin-film processing.
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