Used AMAT / APPLIED MATERIALS Endura CL #9276760 for sale

AMAT / APPLIED MATERIALS Endura CL is a reactor designed to enable process engineers to perform tungsten chemical vapor deposition (CVD) in a variety of thin film applications. This next-generation reactor is suited to the semiconductor industry and is capable of processing tungsten and other metal layers for the deposition of thin film semiconductor devices. AMAT Endura CL reactor offers high-precision, consistent tan-to-tan uniformity at an advanced level. This reactor is designed to provide highly reliable and repeatable CVD processes with low end-of-run wedge variation. APPLIED MATERIALS Endura CL's integrated controlling equipment offers superior uniformity control and full wafer-level process control. Also, the use of higher filament capacities and on-the-fly top-to-bottom uniformity control allows for faster tool recovery. Additionally, Endura CL reactor has advanced wafer-loading and multiple-wafer unloading capabilities, allowing process engineers to maximize throughput and minimize footprint. AMAT / APPLIED MATERIALS Endura CL is combined with the most advanced automation technology, featuring various options such as auto-cleaning, auto-in-process wafer exchange and automatic powder charging. AMAT Endura CL also has feature enhancements such as mid-process exhaust scrubbers, increased workspace, and more. The system also utilizes advanced automation for accurate deposition and process control. Features include an integrated, automatic temperature control unit that ensures precise and reproducible performance; an integrated Gas Flow Balance Control Machine for precise and repeatable gas delivery; and a deposition control tool for enhanced precision control and uniformity. Additionally, APPLIED MATERIALS Endura CL asset delivers improved productivity and reliability with advanced safety features. The reactor comes equipped with an emergency shutdown switch, which provides immediate shut-down of the model when the operator needs it. The equipment also has an automatic gas shutdown feature to avoid the need for manual gas valve adjustments during operation. Endura CL reactor is an ideal choice for semiconductor manufacturers who require high-precision, consistent tungsten CVD processes and are looking for increased throughput and cost-effectiveness. The reactor includes a range of features designed to enable reliable, repeatable performance with minimal downtime, while continuing to process wafers with high uniformity.