Used AMAT / APPLIED MATERIALS Endura CL #9390615 for sale

AMAT / APPLIED MATERIALS Endura CL is a reactor for materials deposition. It is designed for use in silicon-based deposition systems, such as CVD, PECVD, and ALD. AMAT Endura CL operates via a hot-wall vertical-down ceramic-lined cylinder design. This design enables superior uniformity across the wafer's surface, improved clean-in-place (CIP) capability, and long-term durable operation. The reactor consists of several components, such as the heater, source gases, showerhead, HF/RF bias, filament, anode, grid, and baffle. The resistive heating element at the center of APPLIED MATERIALS Endura CL is made up of molybdenum (or tungsten) filaments. This element is powered by up to 3.25 kW of DC power, and is capable of temperatures up to 925°C. The heater is capable of a wide range of processes, including epitaxial growth, film deposition, and thermal annealing. The source gases are fed into Endura CL via a gas manifold connected to the top of the reactor. The two gases most commonly used are silane (SiH4) and diborane (B2H6). Up to four gases can be used in the process. The flow rate and chamber pressure are carefully monitored to ensure optimal deposition conditions. The showerhead at the top of the reactor is designed to evenly distribute the gas into the reaction chamber. The HF/RF bias, filament, and anode combine to provide an electrical potential to etch the wafer surface. The grid and baffle are used to contain the plasma generated. AMAT / APPLIED MATERIALS Endura CL reactor is widely used in the process of fabricating silicon wafers, from thin-film deposition to thermal annealing. The combination of a robust heater and source gases makes AMAT Endura CL a reliable and efficient reactor choice for high volume production. It is capable of depositing films with excellent quality, improved uniformity, and higher throughput than other reactors available. APPLIED MATERIALS Endura CL is the ideal choice for long-term, efficient production.