Used NOVELLUS CONCEPT One #9169829 for sale

NOVELLUS CONCEPT One Reactor is a state-of-the-art, proprietary wafer processing technology specifically made for high throughput applications. This dielectric etch reactor is designed for maximum etch rates, improved dielectric selectivity, and maximum etch uniformity. The primary applications of NOVELLUS CONCEPT ONE include etch of high-aspect ratio features, including gate trenches, shallow trenches, and contact holes. The reactor has an unmatched performance due to its advanced processing technologies, high throughput design, and thermal uniformity enhancements. It also features a three-dimensional shield design, adapted from a high aspect ratio system, resulting in improved product quality. The specialized processing Chamber has an unprecedented combination of technologies that allow for precise etch control, high yields and improved dielectric uniformity. It also has a direct injection source with precise gas flow control, allowing the chamber to be programmed for a precise flow at any given point within the chamber. This feature maximizes uniformity, enables process flexibility and precise high aspect ratio etching. The high aspect ratio feature of CONCEPT One allows for etching of trenches and contact holes that can sometimes be up to 150:1 aspect ratio. This requires both higher power and higher etching rates than traditional etching techniques. To account for this, CONCEPT ONE utilizes a single-frequency microwave source and ion-assisted etching techniques to provide precise etch uniformity and angular control. NOVELLUS CONCEPT One has built-in automation that adheres to high-volume production capabilities. The reactive flow control and other process parameters have been optimized to ensure repeatable process results and ensure a high-yield production rate. The robotically operated equipment allows for fast and precise process control, which further helps to increase production efficiency and reliability. In conclusion, NOVELLUS CONCEPT ONE is an industry-leading wafer processing system, with superior etch rates, selectivity and uniformity. Its dielectric etch reactor, automated controls and integrated single-frequency microwave source accommodate high aspect ratio designs, allowing for improved product quality and increased production throughput.