Used VEECO TurboDisc E475 LDM #9401869 for sale
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ID: 9401869
Vintage: 2010
MOCVD System
High-brightness LEDs: Red, orange and yellow
Multi-junction III-V concentrator solar cells
Operation: 200 300 Epitaxy
Control PC
Electrical and control part
Gas panel part
Reactor part
EBARA ESA70WD
Dry pump
Includes:
As/P Growth chamber
Growth chamber exhaust system
Load lock and platter transfer
Load lock exhaust system
Glove box
Water cooling assembly
Dual Phosphorous trap assembly
Hydrogen detector
System electronics and control modules 380 V
EpiView Local control interface
(7) Liquid refrigerator baths
(9) SS Bubbler legs, 1/8"
Gas panel
In-Situ monitoring system:
(3) REALTEMP 200 Monitoring systems
IDRT/RT Local control assembly
Step up platform
Custom gas panel controller bubbler:
DETe
DMZn
(2) TMIn
(2) TMGa
TMAI
CBr4
TBA
Disilane
Dilution network source manifold (Single bubbler)
Hydride:
Dopant1: Dislane
Dual input Hydride with single standard and single dilution network manifold
Dopant2: Dopant single input Hydride
2010 vintage.
VEECO TurboDisc E475 Low-Density Metallization (LDM) reactor is a tool designed for the production of thick-film, high-performance electronic devices. It is used to deposit metal films onto substrates using a low-pressure, plasma-activated chemical vapor deposition (CVD) process. The equipment utilizes a unique hot, rotating disc to create a uniform film deposition over a large area. The reactor was designed specifically with high throughput and reliability in mind, making it the ideal choice for mass production of semiconductor devices. The system is comprised of a process chamber, upper and lower disc platen assemblies, a baseframe, and alignment and control systems. The E475 reactor process chamber has a short gas line configuration, which allows for rapid, precise gas delivery and rapid startup. The chamber is equipped with wafer transport and support, as well as a gas distribution manifold. The discs are constructed from a high-performance aluminum alloy, providing excellent thermal and mechanical stability. The discs can rotate at up to 3500 rpm and have a maximum temperature of approximately 400°C. The unit is designed for the deposition of metal films, including copper and aluminum metallization, barrier layers, and adhesion layers. It is capable of depositing high-performance films with excellent uniformity and high deposition rates. The machine offers precise control over film thickness and adhesion, providing a high degree of process and material consistency. The E475 also includes process monitoring and control systems which allow the user to precisely adjust deposition parameters. The user interface utilizes an intuitive, graphical operator interface to simplify the setup, start-up, and monitoring of processes. The tool includes a secure login and an audit trail which makes it easier to track process data and results. The reactor is also designed to meet stringent safety requirements, reducing the risk of accidents and improving safety in the workplace. The E475 LDM reactor is an ideal tool for the manufacture of high-performance, reliable electronic devices. With its advanced design and reliable performance, it has been designed for low overall maintenance requirements, making it an effective tool for both small-scale production and large-scale mass production.
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