Used KYORITSU SEIKI KCG6-80H #293664145 for sale

ID: 293664145
Grinding machine.
KYORITSU SEIKI KCG6-80H is an advanced, multifunctional wafer grinding, lapping & polishing equipment which offers superior performance and precise results. This system utilizes top-of-the-line technologies and allows efficient processing of various materials, including substrates, thin films, and panels. It features a spindle holding force of up to 5,500 Newton, an angular displacement of 0.0002 degrees, and an operating frequency range of 14.58MHz. Through its integration of advanced motion control solutions, the unit provides finely tuned accuracy and excellent surface finish. Using the machine, customers can achieve substrates with as low as 0.1μm particle size, high surface flatness, and stable accuracy. Its grinding and polishing equipments utilize a wide range of tooling materials to deliver superior surface finish, form, and contours. The lapping spindles and mechanisms, on the other hand, feature intensive feedback control mechanisms which improve accuracy and reliability. The automated polishing operation also offers enhanced surface quality and appearance. KCG6-80H utilizes a built-in closed-loop three-dimensional motion control tool for optimum performance. It also uses a reciprocating mechanism which allows for uniform and repeatable surface finish. Furthermore, it comes with a spindle temperature control asset which ensures uniform performance throughout the entire process. Finally, it allows for user-defined parameters to be incorporated into the program for specific applications. Overall, KYORITSU SEIKI KCG6-80H is a state-of-the-art model that offers top-notch wafer grinding, lapping & polishing. With its integration of advanced motion control solutions, users can expect excellent surface finish and results. Its automated polishing operation ensures consistent performance and results while its spindle temperature control equipment ensures uniform performance throughout the process. With its integration of user-defined parameters, this system is suitable for specific applications requiring precise results.
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