Used SCHNEIDER CCP 102 #9249642 for sale

ID: 9249642
Polishers 2005-2008 vintage.
SCHNEIDER CCP 102 is a wafer grinding, lapping and polishing equipment designed to provide superior performance for the semiconductor industry. This system is designed to enable the efficient and uniform grinding, lapping and polishing of substrates up to 200 mm in size. The unit features a fixed spindle and a moveable platen, both driven by advanced AC synchronous motors. This design allows the simultaneous grinding, lapping and polishing of the substrate while still maintaining a high level of precision. The grinding wheel consists of an aluminum oxide grinding wheel with an integrated built-in abrasive and grinding fluid delivery machine. This integration allows for reduced grinding times and improved efficiency. The tool is also designed with a vacuum asset that rapidly removes grinding material and eliminates grinding slurry, thus enabling higher levels of surface finish. The lapping mechanism of CCP 102 provides for lapping in both circumferential and radial directions, utilizing a controlled vacuum head. It is designed to operate with standard lapping plates and optional diamond compound. The polishing mechanisms feature both a lift-and-tilt movement as well as an optional magnet-coupled platen assembly. The lift-and-tilt ensures superior surface finish during polishing, while the magnet-coupled platen enables more effective polishing of thick and wide areas. SCHNEIDER CCP 102 is designed to operate in cleanroom atmospheres down to Class 10. This ensures the highest levels of efficiency and purity for all operations. With integrated safety features and advanced component protection, CCP 102 is designed for optimal reliability. Additionally, the control model allows for easy operation by using a graphical user interface. In all, SCHNEIDER CCP 102 is an advanced wafer grinding, lapping and polishing equipment designed to provide exceptional performance and reliability. With advanced features such as integrated grinding wheels, vacuum systems, and a magnet-coupled platen, this system is designed to provide the ultimate in performance and accuracy.
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