Used DAICO SW-1 #9017906 for sale

DAICO SW-1 is a wafer and mask scrubber manufactured by DAICO Industries Inc. This scrubber is designed to offer efficient and cost-effective wafer and mask cleaning to the semiconductor industry. SW-1 wafer and mask scrubber works by using recirculating DI water in combination with air and isopropyl alcohol to remove organic debris from semiconductor substrates. This scrubber is constructed from stainless steel which provides a long service life and easy maintenance over years of use. DAICO SW-1 wafer and mask scrubber utilizes an air-sparge system which is designed to push thorough DI water. The DI water is then mixed with a precise ratio of isopropyl alcohol, which works to breakup and dissolve any present organic residue. This mixture of air and DI water then contacts the wafer and mask surface with its gentle scrubbing action. The scrubber can be optimized by using different nozzles and spray patterns. This optimized scrubbing allows for accumulation of materials in difficult to reach locations on the wafer or mask. SW-1 scrubber also features a centrifugal water-spray capability. This feature uses two vertically positioned nozzles to create a turbulence of water and isopropyl alcohol at high-speed. This turbulent wash is particularly efficient at removing stubborn organic contaminants such as photoresists and photoresist residues. The centrifugal water-spray capability is also adjustable in angle and intensity, so the user can dial in the best cleaning and scrubbing action for their application. Furthermore, DAICO SW-1 scrubber offers a dry-air blowoff step as a final cleaning procedure. This dry-air blowoff step removes any remaining moisture and isopropyl alcohol solution after the scrubbing process. This prevents any unwanted contaminant carryover that could damage subsequent processing steps. SW-1 scrubber is also equipped with a wide range of safety and convenience features, such as stainless steel chemical solution tanks and transparent plastic covers for the scrubbing chamber. These innovations help the user maintain a safe and clean work environment. Furthermore, the scrubber is designed with an integrated chemical management system for secure and precise levels of DI water, air, and IPA mixtures. This ensures accurate and consistent cleaning performance from session to session. In summary, DAICO SW-1 scrubber is designed and engineered to offer a comprehensive and cost-effective solution for wafer and mask cleaning. The scrubber utilizes a recirculating DI water system and an adjustable spray pattern to provide efficient and reliable cleaning results no matter the intensity of the scrubbing challenge. Furthermore, the scrubber features a range of safety and convenience features which the user can rely on.