Used MAT MAT 507BW #9382388 for sale

MAT MAT 507BW is an innovative wafer and mask scrubber that can easily reduce particle contamination and other residues on substrates and masks during the wafer fabrication process. This advanced scrubber is designed to efficiently remove organic and inorganic particles, allowing for the fast processing of multiple substrates. The wafer and mask scrubber consists of a compact and robust stainless steel scrubber chamber with two stages of particle-removing scrubbing discs. The first stage is used for the removal of particles from wafers and reticles patterns. The second stage helps in the removal of particles from the patterns of SMIF/FOUP wafers. The scrubber also features an automated multiple-wafer cassette handling equipment that simplifies the handling of wafers. MAT 507BW features automated control for scrubber operation with advanced features such as wafer count, window size, scrubbing pressure, wafer indexing, and transducer health monitoring. The scrubber also has a pressure-sensing element for real-time monitoring of the substrate scrubbing process, allowing for precise control of processing conditions. The scrubber also has a wetting system that helps keep the scrubbing surfaces constantly lubricated, ensuring clean and uniform scrubbing of wafers. The scrubber also has an advanced extraction unit that helps remove any particles that are generated during the scrubbing process. This helps in maintaining an optimal level of cleanliness in the chamber, while also preventing particles from adhering to the wafers and masks. The scrubber also features user-friendly programming and operating commands that make it easy to use. MAT MAT 507BW is a versatile scrubber that is ideal for use in semiconductor wafer fabrication and mask cleaning processes. Its multiple-wafer cassette handling machine speeds up the scrubbing process while also helping to reduce the risks of contaminants from entering the chamber. Its advanced extraction tool helps to keep the processing environment clean and free of particles, while its pressure sensing element ensures precise and consistent scrubbing. This advanced wafer and mask scrubber is a valuable tool in industry, and its robust design ensures reliable, high-quality performance.