Used MYSTAIR Misonix MTS 22 #138819 for sale

ID: 138819
Air scrubbers.
MYSTAIR Misonix MTS 22 is a powerful and efficient wafer & mask scrubber developed by MYSTAIR for use in the semiconductor industry. It has been engineered to provide a cost-effective, robust and reliable platform for the cleaning of semiconductor wafers, masks, and other materials of various shapes and sizes. The unit is equipped with two independent scrub heads, allowing for simultaneous cleaning of two wafers or masks without necessarily needing to alternate one scrub head between them. Misonix MTS 22 is designed to offer a highly efficient scrubbing action to remove particles, residues and contaminants without causing any damage to the substrate. This is made possible through the scrubber's cycle-reversal feature, which alternates the direction of the scrubber brushes while constantly scrubbing away unwanted particles. As a result, the scrubber can be used on a variety of materials with excellent cleaning results in a short amount of time. Furthermore, the unit also features variable rotation speeds of up to 5,000 rpm, allowing for precise scrubbing operations and further improving the resulting cleaning results. MYSTAIR Misonix MTS 22 is also equipped with an electronic timer equipment for programming cleaning cycles and for subdividing the scrubbing process into several steps. As a result, it is possible to tailor the scrubbing process to specific substrates by automatically adjusting the scrub head speed, angle, and force as needed. Additionally, the scrubber also features a splash guard and fluid containment system to help contain any mess that is created during the scrubbing process. In conclusion, Misonix MTS 22 wafer & mask scrubber is a powerful and reliable cleaning device for use in the semiconductor industry. It is designed to cleanse substrates rapidly and with minimal damage to the material, features variable cycle speeds, and is equipped with an electronic timer unit for programming and customizing the cleaning cycle to suit specific substrates. The unit also features a splash guard and a fluid containment machine for further preventing messes, making it an excellent choice for effective and efficient wafer & mask cleaning.
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