Used ASML PAS 5500 / 80 #293591386 for sale

A ASML PAS 5500 / 80 is a step-and-scan-based advanced projection lithography equipment by ASML with a dual armor top frame. It is used to project precise images onto wafer substrates, typically to manufacture semiconductor chips. This system typically features an array of encoded scanners, optical elements, and actuators and control systems that allow for ultrashort, repeatable scan-based steps. The lithography systems in ASML PAS 5500/80 series offer up to 1.5 nanometer of resolution, and can expose surfaces with a minimum spot size as small as 30nm. This unit comes with a 40nm resolution phase plate and an ICOS 4.0 UV immersion lithography technology machine, which allows for high throughput and precise accuracy. Additionally, PAS5500 / 80 series provides enhanced speed, process optimization, and lithographic accuracy unlike many other systems. These capabilities are integrated into the 95nm, 80nm, and 65nm nodes. PAS 5500 / 80 tool is equipped with a variety of optical components and lasers, including aspheric lenses, aspheric mirrors, beam-splitters, dichroic filters, and gratings. These components and lasers form an integrated combination of high-resolution optics, allowing users to achieve better pattern registration, improved line and edge ability, and improved resolution uniformity. In addition to the optical components and lasers, ASML PAS5500 / 80 series also consists of a helium-neon laser and a diffraction-limited projection optics package. The helium-neon laser allows for a wide range of wavelength shifts, and the diffraction-limited projection optics package can increase reticle imaging and decrease both the aberration and distortion of the spot size. PAS 5500/80 asset also contains an independent operator control that can be connected to a computer display, in order to better manage the model. This control interface is capable of providing closed-loop control, continuous stage scanning, and alignment, as well as enabling rotation, tilt, and focus of the portion of the substrate that requires exposure. The design of ASML PAS 5500 / 80 series is able to hold 300mm and 200mm substrates, and can handle substrate temperatures ranging from -40°C to +90°C. In addition, the equipment has a dual-view wafer positional encoder, which provides very accurate results when it comes to fiducial search and alignment. In summary, ASML PAS 5500/80 from ASML is a state-of-the-art wafer stepper that has the capability to project precise images onto substrates for semiconductor manufacturing purposes. It is designed with advanced optics and a variety of lasers, as well as an independent operator control that can be connected to a computer display. The lithography systems from PAS5500 / 80 series offer up to 1.5 nanometers of resolution, and can expose surfaces with a minimum spot size as small as 30nm.