Used CANON FPA 6000 ES6a #9281803 for sale

CANON FPA 6000 ES6a
Manufacturer
CANON
Model
FPA 6000 ES6a
ID: 9281803
Wafer Size: 12"
Vintage: 2005
Krf Scanner, 12" 2005 vintage.
CANON FPA 6000 ES6a is a high-precision, high-performance wafer stepper capable of highly repeatable precision nanoscale patterning. It is especially valuable in the semiconductor industry, as it can produce extremely fine patterns with a high level of accuracy and repeatability. The ES6a utilizes ultra-short pulse (USP) laser technology to generate patterning down to 16nm intervals. It also employs a range of advanced lithography techniques for higher resolution devices. The PAT-TM Alignment Equipment enables accurate alignment during exposure, allowing for the most precise patterning possible. The proven and reliable oscillatory stage drive system accurately and precisely moves the wafer in a highly repeatable manner. It is also equipped with CANON patented 'Compact-Step' which reduces time spent between exposure step operations. The imaging unit utilizes a stepper capable of supporting a range of imaging formats, as well as edge-positioning pulses. The position and presence of isolated particles is quickly checked using a variety of sensors, and sizing of the particles is performed with a highly sensitive imaging machine. The ancillary optics can be used to perform real-time monitoring of the entire operation. The ES6a is a highly efficient wafer stepper featuring a floating quartz/ceramic chamber with built-in gas control, as well as a low-profile chuck. These features enable stable patterning for optimum line width repeatability, higher throughput and better overall quality. In addition, the proprietary Super-Light™ Laser Fluorescence Monitor (SLF) ensures accurate wafer focusing and pattern overlay defects are all under control. This monitor is also capable of detecting a wide variety of defects such as aggregation of photosensitive materials. The ES6a is a well-rounded wafer stepper capable of producing highly repeatable, extremely fine and accurate nanoscale patterns. It is a vital tool in the semiconductor industry, capable of reliably increasing production throughput while maintaining excellent quality.
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