Used KLA / TENCOR Alpha Step 200 #293588045 for sale

ID: 293588045
Surface profilometer Model no: 1002-010 PCB Speed control.
KLA / TENCOR Alpha Step 200 is a wafer testing and metrology equipment designed to provide fast and accurate data that supports product development, process monitoring, and technology transfer. This system provides leading edge capability for in-line testing, process control, and defect classification on a wide variety of substrates such as silicon, sapphire, ceramic, and more. The Alpha Step 200includes two dual-beam laser scanners, a displacement stage, a laser height sensor, an integrated metrology unit with an ultra-high precision motorized rotation stage, and an integrated optical machine. The two dual-beam laser scanners enable the accurate measurement of surface and subsurface features, such as step heights, feature edges, and roughness. Through mapping of entire wafers, these features can be spatially located and accurately measured. The displacement stage ensures precise navigation of the laser beam over the sample, providing accuracy and repeatability KLA ALPHASTEP 200. The laser height sensor is utilized to define the vertical (or scan) axes, while the integrated metrology tool includes high-precision rotary actuators and a motorized rotation stage provides continuous 3-dimensional analysis of the sample. Finally, the integrated optical asset provides additional flexibility and suite of different analysis techniques, such as transmitted light observation, dark field imaging, fluorescence imaging, and more. Through this, TENCOR ALPHA-STEP 200 is able to provide an in-depth characterization of the sample, including high-resolution acquisition of topography, defect detection, and composition distribution. TENCOR Alpha Step 200 from KLA provides an excellent solution for those looking for a reliable, accurate, and cost-effective solution for in-line testing, process control, and defect characterization. The combination of dual-beam laser scanning, high-precision motorized rotation stage, and comprehensive optical model ensures fast, precise, and comprehensive results for process monitoring, technology transfer, and development.
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