Used KLA / TENCOR Alpha Step 200 #9289904 for sale

KLA / TENCOR Alpha Step 200
ID: 9289904
Profilometer.
KLA / TENCOR Alpha Step 200 is a wafer testing and metrology equipment designed specifically to characterize the properties of wafers and device structures on the nanoscale. The system operates using a combination of scanning electron microscopy (SEM), Atomic Force Microscopy (AFM), and surface profilometry technologies. The unit features a high resolution monochrome imaging machine with a robust design that provides a reliable and consistent image quality. The imaging tool includes a 60kV secondary electron detector and a wide range of imaging modes such as optical SIM, SEM, and SEM/AFM. It utilizes a high-efficiency EDS detector that offers excellent sensitivity, excellent spatial resolution, and fast passive multichannel collection of X-ray spectra to analyze the composition of the wafer. The asset offers an automated and user-defined sample navigation model that allows for rapid, non-contact imaging of the wafer. It also features a high-speed, multi-axis auto-focus equipment that enables highly accurate and repeatable imaging without user intervention. The system allows for automatic selection of imaging parameters for various types of measurements, and allows for full integration with KLA Spectra and Polarimetric wafer analyzers. KLA ALPHASTEP 200 offers a number of other features designed to improve wafer characterization. It offers a sub-nanometer parametric data processing unit that allows for improved accuracy in measurements as well as automated wafer analysis. The machine is also able to optimize spectral acquisition, storage and visualization. Additionally, the tool includes processors and software packages to analyze data, determine repeatability and allow for quick sharing of results with other systems. TENCOR ALPHA-STEP 200 is compliant with industry standards such as SEMI, PIES and Imec, making it an ideal choice for a range of applications. With its robust design and advanced features, the asset provides a robust and powerful solution for nanoscale characterization.
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