Used TOKYO SEIMITSU YR-60 #9258195 for sale

TOKYO SEIMITSU YR-60
ID: 9258195
Vintage: 1985
Wafer surface measurement system 1985 vintage.
TOKYO SEIMITSU YR-60 is a highly advanced wafer testing and metrology equipment designed for inspecting semiconductor wafer properties. Utilizing vision-based technology, YR-60 can accurately inspect the entire wafer surface including irregular shape or curved wafers. The system is comprised of an automated x-ray unit for high-accuracy wafer thickness measurement, as well as a microscopic measurement station with 3D inspection capabilities. Additionally, high-resolution imaging is provided by an advanced camera machine with a wide microscope range and control sensors. The advanced camera tool allows for easy alignment, offering superior visibility to ensure precise measurements. TOKYO SEIMITSU YR-60 is designed to handle wafers up to 300mm in diameter. Multiple performances can be performed on the same wafer, and each performance is stored in a database for future reference. This feature eliminates the need to physically measure and compare each wafer. In addition to measuring thickness, YR-60 is able to examine the wafer's form, dimensions, flatness, and geometry. The asset employs surface roughness measurements to ensure that the wafer surface has a uniform texture. TOKYO SEIMITSU YR-60 also offers a wide range of strain measurements, including Curvature, Bond Strength, Stress and thermal Stiffness. Data from YR-60 is analyzed by several advanced software solutions, including SEIMITSU's SEMITOOL Test Suite, which automatically detects and presents images, surface characteristics, and overall wafer condition reports. The SEMITOOL Data Analyzer is also used to analyze the characteristics of a wafer's performance, allowing for reliable data comparisons and unbiased data analysis. TOKYO SEIMITSU YR-60 is a highly versatile and sophisticated model for wafer testing and metrology. Its advanced camera technology, measurement accuracy, and automated surveying and analysis capabilities makes it an ideal choice for semiconductor production of all levels of complexity.
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