Evaporator, with NetTRACK INBOARD-5 real-time computer control with True 1 button Operation Data logging Recipe management SECS-GEM Server compliant Process Chamber: 32" x 32" System footprint: 70" W x 43" D x 80.5" H Process Stations: 400°C, 4-8-16 KW Cryo pump / regeneration function ELO 15" Touchmonitor Multitasking Windows XP Platform Water supply: 3 - 5 GPM Air supply: 85 - 125 psig 208 VAC, 3P, 5 wire, 175 Amps.

evaporator with control panel and spare parts.

Evaporator, 48" box Thickness measurement pumps, and an IBM controller (needs upgrade) Two thickness monitor RF source for plasma cleaning Quartz heater for substrate heating with power supply CV20 E beam power source Two E beam - one 4 pocket and one single pocket Rotatory substrate holder One 20" Cti Cryo and one 10" Cti Cryo Control system with a touch screen (1985 vintage built by IBM) Mass flow and controllers The system is fully assembled and has not been used in 3 years The chamber has been sealed Functional condition 1985 vintage.

E-beam evaporation system System fabrication: Cabinet, Steel Framework, System Mounted on castors Fully-enclosed system cabinet with full opening service door Deposition chamber: 20" diameter x 9" high stainless steel Designed for waist high substrate loading and unloading 18" diameter stainless steel evaporation source chamber with viewport Pumping system: Cryogenic pump CTI-8 cryo with SC helium compressor Roughing pump: 27 cfm roughing pump High vacuum valves: Poppet valve Roughing, Leak-check, Backing, and Vent Valves Chamber gauging: Versavac combination ionization and TC gauge Deposition: E-beam TELEMARK 271 - 4 pocket 30cc Electron Beam Gun 6 pocket crucible indexer. Hardwired safety interlocks CV-8, 8kW power supply with X-Y beam sweep controller Deposition source shutter: Electro-pneumatic source shutter: Deposition controller:M MAXTEK 360 quartz crystal deposition controller Single quartz crystal sensor (water-cooled) Substrate heat: 2 kW quartz lamp substrate heating Substrate fixturing: Planetary or Lift-off tooling available Substrate rotation assembly with variable speed drive motor Vacuum controller: Temescal Auto/Manual vacuum sequence controller. OEM manuals Can be demonstrated.

E-beam evaporation system Hivac Process Chamber: Chamber18”x 9” (BJD standard substrate chamber) Chamber Door: Water cooled stainless steel, hinged, 90º open model , easy touch self-aligning door closure and sealing Chamber attachment: View port, with film shutter , Chamber Shielding, Flange port for RGA, Source shutter Frame system: Frame and Panels are standard powder coated Fixturing system: Substrate holder (Customer driven) Rotation System Revolution Fixturing Drive Substrate Holder: dome (Material: 316 Stainless Steel) Back side loading (per customer drawing) Fixture assembly Fixturing stand for loading and unloading wafers Rotation speed control ± 1RPM, display on screen (PC control) Vacuum system: Roughing pumping system: Mechanical pump (Customer selected) Roughing Valve Standard KF40 roughing valve Vent Valve (soft vent optional) Vacuum piping Leak check port with manual valve High Vacuum Pump System: Cryo Pump CTI Cryo torr 8 Cryo Compressor CTI 8500, with cables Helium Lines Quick Disconnect Coupling, Length 3m Gate Valve N2 Purge Valve Cryo Regeneration Valve Evaporation Source: E-Gun: Telemark 271 or EB Sources, crucible 6 pocket / 25cc (std.) Crucible rotation drive assembly E-beam power supply Telemark solid state power supply Beam sweep control Telemark sweep control Source control Telemark source control Substrate Heater array: Infrared ramp heater assembly with lamp modules (1X1000W each) Quartz lamp covers with integrated side shielding Heater power supply 1kw power supply Thermocouple single element Temperature Control, ramp rate selectable, by PC control Pressure Gauges: Grandville Phillips convectron gauge (Foreline) Grandville Phillips convectron gauge (chamber) Grandville Phillips convectron gauge (Cryo) Grandville Phillips ion vacuum gauge (chamber) Grandville Phillips ion vacuum gauge (Cryo) Film Thickness Control: Deposition control Inficon SQM 242 (MDC-360C or IC/5 optional) Crystal sensor Inficon sensor Operation Panel: Industrial PC INBOARD-5 automatic control PC Touch Screen 15” ELO Monitor Arm All angles and heights adjustable Emergency stop button Front and backside Main Breaker Vacuum performance: Ultimate pressure <10-8 Torr Cryo Vacuum <10-8 Torr Chamber Vacuum Pumping speed: <1_10-7 Torr within 40min Pressure raising rate: <10-5 Torr within 5min after Hivac close Condition related: Measure vacuum performance after continuous pumping 12 hours or longer No heating, measure at room temperature Clean dry and empty Start measuring of pumping speed after N2 vent Measure pressure raising speed after system reach base pressure at 10-6 Torr Measure tool is ionization gauge controlled by auto operation system Deposition performance: Uniformity of film thickness (within wafer) up to±3% Uniformity of film thickness (wafer to wafer) up to±3% Optional items: CTI Polycold for faster pumpdown times NetTRACK Barcode Reading Assembly and integration Spare set of chamber shield Crucible liner Spare set of dome planetary assembly.

evaporator / bell jar deposition system CV-8 power supply Six 15cc hearths TFI Telemark 270 series gun with XYS sweep control Cryopump Granville Phillips ionization gauge Inficon crystal monitor Fixed 8" substrate carrier Rotary substrate motor driving system Planetary dome MKS gas flow controller

Evaporator, Planet for 3” wafer, 4 pocket E-gun, 6 kw power supply, Diffusion pump, E2M40 Rotary pump, Vacuum controller, Sweep controller, very good condition.

Evaporator.

Evaporators.

vacuum system Manual load batch system Stainless steel construction Bell jar lid: 18" diameter by 9" height Source tray: 18" diamerter Operating range: 1 x 10^-6 range Lowest range: 2 x 10^-7 Torr in 30 min CTI Croygenics pump, 8".