Reactors: APPLIED MATERIALS Centura ACP RP

ID#: 9118301 Manufacturer: APPLIED MATERIALS Model: Centura ACP RP Category: Reactors Vintage: 2008 Wafer Size: 12" Equipment Details: EPI System, 12"

Chamber type / Location / Selected option:
Application level 1: Reduced pressure
Application level 2: Reduced pressure
First in fab system or apps: No
Position A: (RH3) Reduced pressure epi
Position B: (RH3) Reduced pressure epi

Fab option:
Electrical: Semi

A) RH3 Reduced pressure epi
RP Chamber / Selected option:
Thickness control option: AccuSETT 2
Lamp type: USHIO BNA8

Not included:
Susceptor type
Pin type
Preheat ring
Susceptor support shaft

B) RH3 Reduced pressure epi
RP Chamber / Selected option:
Thickness control option: AccuSETT 2
Recipe control AccuSETT: Yes
Lamp type: USHIO BNA8

Not included:
Susceptor type
Pin type
Preheat ring
Susceptor support shaft

Gas delivery options:
Gas panel: Bottom
MFC Type: Unit 8561
Purge pump: Yes
Regulator and displays: Transducers and regulators
Transducer display type: SI (KPA)
H2 Leak detector: Single

RH3 Gas pallet:
Slot 1: H2 Main 50 SLM, Normally open
Slot 2: H2 Slit 10 SLM, Normally open
Slot 3: MFC: HCL Wafer clean 500 SCCM
Slot 4: Restrictor: HCL Chamber clean 15 SLM restrictors
Slot 5: SiH4 500 SCCM
Slot 6: SiH2 Cl2 500 SCCM
Slot 7: Direct inject dopant 1 100 SCCM
Slot 8: Direct inject dopant 2 100 SCCM
Slot 9: DCS 500 SCCM
Slot 10: Spare
Slot 11: GeH4 500 SCCM (GeH4 1% in H2)
Slot 12: Mixed inject dopant 1 100 SCCM
Slot 13: Mixed inject dopant 2 100 SCCM
Slot 14: Auxiliary dopant germane 100 SCCM
Mixer 1: Dopant 100 SCCM H 20 SLM
Mixer 2: Dopant 100 SCCM H 20 SLM

Mainframe options:
General mainframe:
Mainframe type: ACP Block 2
Load locks: Batch load lock
Chamber interface: Vented stainless steel insert
Water hose fittings: Yes
Water module stand: Yes
Upper frame H2 leak detector: Yes

Chamber common and integration:
Mass flow integration: Yes
Multi water clean: No MVC for (4) chambers systems

Factory interface options:
Factory interface system 5x:
Communication protocol: SECS
Wafer transfer robot: YASUKAWA
Power supply: FFU 208 VAC, Controller 110 VAC
ULPA Filter: PTFE Boron free ULPA
Orienter: Re aligner
End effector: Edge grip PEEK material
Wafer storage: (2) Slots
FI UIT Light: (2) Fluorescent lights
Wafer mapping: LED Sensor detection
(3) Load ports
Load port types: TDK25 Wafer FOUP V2
E84 Carrier handoff: Upper E84 interface enabled OHT
E84 PIO Sensor and cables: Upper E84 sensors and cables 25 pin D-sub connector
E99 Carrier ID: Tiris with RF
Operator access switch: Yes
Carrier ID host interface: Yes
Light towers: (4) Colors
Ionizer: Yes

Remote options:
System monitors 5x FI:
Monitor 1: 17” Flat panel with keyboard on ergo arm
Monitor 1 cables: No
Monitor 2: Remote 17” flat panel on stand
Monitor 2 cables: 50 Feet with 41 feet effective
Monitor 3: No

2008 vintage.
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