Used ASM A 412 #9176794 for sale

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ASM A 412
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ID: 9176794
Vertical LPCVD furnace Dual reactor.
ASM A 412 is a diffusion furnace and accessories designed for high performance wafer-level materials. In particular, it is suitable for applications that require rapid deposition of thin films, such as high-temperature superconductors, MEMS devices, MEMS sensors, and thin-film transistors. The equipment has a maximum temperature of 1350°C, allowing high-temperature processing. It is easy to configure, with a variety of options for furnace hoods, source materials, and ampoules. ASM A412 furnace is mounted on a stand that includes a portable rolling cart or a compact wall mount. It features a variety of automated safety features, including an alarm system and automated stop if the furnace temperature falls out of range. The furnace is protected by a stainless steel hood, which allows precise control of the atmosphere and prevents gas leakage. The unit can be programmed to control the atmosphere pressure, with up to seven independent set points, and the machine also incorporates a set of diagnostic features to facilitate troubleshooting and maintenance. The furnace can be customized with several accessories. These include multi-segment wafer holders, ampoules and ampoule holders, and specialty materials. A silicon carbide muffle allows for rapid thermal processing of wafers, with an adjustable heating rate of up to 50°C/sec. The tool includes a diatomic atmosphere injector, which allows for precise control of the gas flow rate. This allows for rapid heating and cooling of the wafers. The furnace also includes a variety of ancillary equipment, such as a thermocouple asset, electronic pressure gauges, and a vacuum pump. The integrated thermocouple model allows for precise control of the fume exhaust, and can be used to monitor the temperature of the furnace and the wafers. The pressure gauges enable precise control of the atmosphere pressure for different processing stages and the vacuum pump enables maintenance of a high vacuum in the chamber. In summary, A 412 diffusion furnace and accessories are designed for efficient and safe deposition of wafer-level materials. The equipment features a wide range of automated safety features, adjustable atmosphere pressure, and a range of ancillary equipment to simplify and optimize the thermal processing of wafers.
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