Used ASM A 412 #9176795 for sale

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ASM A 412
Sold
ID: 9176795
Wafer Size: 12"
Vertical LPCVD furnace, 12" Dual reactor.
ASM A 412 is a diffusion furnace and accessories that is designed for semiconductor crystal growth applications. The furnace is equipped with an advanced automatic controlled type of diffusion source equipment, allowing for precise control of the diffusion rate and temperature. The diffusion furnaces also feature a high-torelance chamber with a uniform-heating system and a rigid body design. The furnace is capable of delivering uniform diffusion results over the entire diffusion process. The uniform-heating unit ensures that the chamber temperature and the gas flow rate are kept consistent throughout the process. The diffusion furnace also features a programmable multi-zone protection machine to reduce the possibility of contamination and operator error. The furnace has a fast response time for load and unloading of wafers, providing quick turnaround times for users. The rapid diffusion process can also reduce losses from the diffusion process and improve product yields. Furthermore, the unique design of ASM A412 diffusion furnace can prevent gold or carburizing contamination. The furnace utilizes a multi-functional vacuum chamber which can be used for both cold and hot operation. This feature is especially useful for depositing layers of materials or for fabricating multiple-layer systems on the substrate. In addition, the vacuum chamber is designed to allow for rapid evacuation and rapid pressure changes. The furnace also features a wide variety of input and output configurations to suit different applications. It has multiple ports for controlling gas flow and temperature, as well as a number of indicators and alarms for trouble shooting and control. This allows users to adjust the procedure, check the status of the tool, and select processes more quickly. In addition, A 412 furnace includes a wide variety of accessories such as sample holders, shutters, and thermocouples for efficient control and monitoring of the diffusion process. The furnace includes a variety of additional safety features such as thermal fuses, water cooling, and a combination indicator/interlock switch. Overall, A412 diffusion furnace and accessories provide a reliable and cost-effective solution for semiconductor crystal growth applications. The furnace is capable of delivering uniform and repeatable results while promoting a safe and efficient work environment.
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