Used ASM A 412 #9176796 for sale

ASM A 412 Diffusion Furnace is a powerful and reliable tool for advanced Diffusion Bonding and Epitaxial growth technology. It is suitable for various applications, including semiconductor device fabrication, MEMS (microelectromechanical systems) devices, advanced process device technologies, and advanced packaging. ASM A412 Diffusion Furnace is equipped with a horizontally arrayed, quad-zone, steady-state, vacuum-controlled vertical furnace, a 4-zone, 3000 W multicrystal thermal plate, and a wafer-stabilizing mechanism. The wafer-stabilizing mechanism ensures high uniformity of wafer temperature, which is one of the main advantages of the diffusion furnace. The temperature range of the furnace is from room temperature to 1200°C. The temperature stability can be maintained within 0.1°C and the temperature uniformity is typically better than 0.5°C. The furnace also comes with a variety of features and accessories. For example, it has a turbo pump to improve the pumping rate and reduce the time to establish vacuum up to 1E-4 Torr before the diffusion process, and the gas opening and exhaust port that allow precise control of pressure and gas flows during the process. The furnace also has a unique counter-rotating mechanism to reduce the sputter etching effect. The endplate can accommodate sample sizes of up to 8" in diameter. Moreover, the furnace offers a wide range of applications by taking advantage of its bottom metal heating elements and its ability to perform low temperature epitaxial growth and oxidation, specific conduction pattern deposition, radiation hardening and rapid thermal annealing, and laser-assisted metal patterning. Overall, A 412 Diffusion Furnace is the ideal choice for advanced Diffusion Bonding and Epitaxial growth technology. Its easy to control temperature and uniformity, its robust and reliable design, and its wide range of features and accessories make it the perfect choice for a variety of applications.