Used ASM ETW-450 #9200208 for sale

ASM ETW-450 is an advanced diffusion furnace used to introduce gas species into solid materials. It is a powerful and versatile tool which enables the incorporation of dopant elements, such as arsenic and phosphorus, into the grain structure of a wide range of semiconducting materials, both in the form of solid single crystals and in thin films. The system consists of the main furnace unit, an annealer, and an associated chamber for doping processes. The furnace chamber is lined with graphite insulation, and the annealer is fitted with a graphite boat base. Thermal uniformity in the annealer is ensured by air circulation. In addition, the system can be interfaced with either a hot wall or cold wall type atomizer in order to increase the efficiency of the dopant incorporation process. The furnace can be operated in either a single-stage or two-stage configuration. In single-stage operation, gas species are injected into the hot zone of the furnace, where temperatures of up to 1000°CAE attained. The resulting species are then diffused into the sample material. In two-stage operation, gas species are first injected into the cold zone of the furnace where temperatures of up to 150°CAE reached. This localizes the dopant into specific or multiple hot zones of the sample. After achieving the desired level of localizing the dopant, temperatures in the hot zone are elevated to the operation desired temperature, thus allowing the diffusing of the gas species into the sample material. ETW-450 is equipped with a number of safety features to help ensure a safe working environment, such as backfilled inert gas control, monitored temperature and pressure sensors, and digital gas control. All in all, the system is an efficient and safe method of depositing dopant elements into semiconductor materials. Its flexibility, combined with its reliable performance, provides excellent results and ensures repeatability in manufacturing processes.