Used ASM SP 32 #9136879 for sale

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ASM SP 32
Sold
ID: 9136879
Diffusion furnaces.
ASM SP 32 is an annealing and diffusion furnace from ASM International. It is designed for use in semiconductor device fabrication and features advanced process control to optimize process performance. The discrete level panel access on SP 32 allows rapid and precise tuning of the process parameters. The quartz glass panel and inner wall combine to reduce vibration and thermal gradients in the furnace, providing a uniform temperature profile throughout the work chamber. The large quartz platter can hold up to four 8" or three 12" or 2 15" wafers at a time for annealing and diffusing processes. The internal fan provides a turbulent gas flow, resulting in an improved thermal profile and uniform heating of the wafers. It is also equipped with multiple gas channels, which can be utilized for gas delivery or other functionality. Additionally, the quartz parts are reusable and have sufficient resistance to withstand prolonged operation in corrosive environments. The built-in programmable controller has both manual and automatic modes for automatic process control, monitoring, and steps for total cycle management. Additionally, the temperature and operating parameters can be saved in the controller allowing for easy sharing between different users. The standard model has a maximum operating temperature of 900 °C and a maximum heating rate of up to 150 °C/min. The furnace is also available with an optional rapid chilling system to reduce cycle times and facilitate processing of thermal sensitive substrates. ASM SP 32 comes equipped with a single axis automated loading system, making it suitable for continuous batch runs with full automation. The access panels are specially designed to minimize heat transfer and minimize particle deposition, ensuring high-quality results. Several safety interlocks are built into SP 32 to prevent accidents and ensure secure operations. Overall, ASM SP 32 is a reliable and highly precise process that can be used to diffuse, anneal, or nitride a variety of semiconductor substrates. With its high-performance programmable controller and various access panels, users can easily program, monitor, and control the entire process for exceptional performance.
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